{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9760020","patent":{"patent_number":"US-9760020","title":"In-situ metrology","assignee":null,"inventors":[],"filing_date":"2014-01-23T00:00:00.000Z","publication_date":"2017-09-12T00:00:00.000Z","cpc_codes":["G01N","G01N"],"num_claims":44,"abstract":"Metrology methods and systems are provided, which measure metrology targets during the exposure stage using reflected or diffracted exposure illumination or additional simultaneous illumination having longer wavelengths than the exposure illumination. The metrology measurements are used to correct the lithographic process in a short loop, enabling realtime and even predictive error correction. The metrology methods, tools and systems also include defect detection during the exposure stage."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"In-situ metrology","description":"Metrology methods and systems are provided, which measure metrology targets during the exposure stage using reflected or diffracted exposure illumination or additional simultaneous illumination having","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9760020","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9760020","citation_suggestion":"Patentable. \"In-situ metrology\" (US-9760020). https://patentable.app/patents/US-9760020","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9760020","json":"https://patentable.app/api/llm-context/US-9760020","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T03:51:51.271Z"}