{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9761620","patent":{"patent_number":"US-9761620","title":"Method and system for manufacturing using a programmable patterning structure","assignee":null,"inventors":[],"filing_date":"2016-09-19T00:00:00.000Z","publication_date":"2017-09-12T00:00:00.000Z","cpc_codes":["H01L","G02F"],"num_claims":13,"abstract":"A charge array wafer includes a plurality of electrical charge storage cells disposed in an array configuration. A programmable amount of charge in each of the electrical charge storage cells causes a predetermined electric field to extend from a charge storage layer, through a passivation layer and into the space above the passivation layer, and the predetermined electric field is operable to attract deposition material to the top surface of the passivation layer. The deposition material may be a gas, a liquid or a powder, having a minimum feature size ranging from tens of nanometers to around five microns. The array of electrical charge storage cells includes an uninterrupted two-dimensional array extending over greater than 100×100 electrical charge storage cells without a select gate and without a bit-line contact positioned between any of the electrical charge storage cells."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and system for manufacturing using a programmable patterning structure","description":"A charge array wafer includes a plurality of electrical charge storage cells disposed in an array configuration. A programmable amount of charge in each of the electrical charge storage cells causes a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9761620","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9761620","citation_suggestion":"Patentable. \"Method and system for manufacturing using a programmable patterning structure\" (US-9761620). https://patentable.app/patents/US-9761620","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9761620","json":"https://patentable.app/api/llm-context/US-9761620","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T09:28:37.063Z"}