{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9761692","patent":{"patent_number":"US-9761692","title":"Method of using polysilicon as stop layer in a replacement metal gate process","assignee":null,"inventors":[],"filing_date":"2016-05-23T00:00:00.000Z","publication_date":"2017-09-12T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":6,"abstract":"A method for fabricating semiconductor device preferably forms a stop layer composed of amorphous silicon between a first BM layer and a second BBM layer of one of the gate structure during the fabrication of a device having multi-VT gate structures. By doing so, it would be desirable to use the stop layer as a protecting layer during the etching process of work function metal layers and the second BBM layer so that the first BBM layer could be protected from etchant such as SC1 and the overall thickness of the first BBM layer and the performance of the device could be maintained."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of using polysilicon as stop layer in a replacement metal gate process","description":"A method for fabricating semiconductor device preferably forms a stop layer composed of amorphous silicon between a first BM layer and a second BBM layer of one of the gate structure during the fabric","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9761692","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9761692","citation_suggestion":"Patentable. \"Method of using polysilicon as stop layer in a replacement metal gate process\" (US-9761692). https://patentable.app/patents/US-9761692","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9761692","json":"https://patentable.app/api/llm-context/US-9761692","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T04:54:59.152Z"}