{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9761708","patent":{"patent_number":"US-9761708","title":"Method of manufacturing semiconductor device and semiconductor device","assignee":null,"inventors":[],"filing_date":"2016-05-04T00:00:00.000Z","publication_date":"2017-09-12T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":17,"abstract":"A semiconductor device includes a supporting substrate, an insulating film formed in a first region over the supporting substrate, a first semiconductor layer formed over the insulating film, a first epitaxial layer formed in an opening of the insulating film in a second region over the supporting substrate, an element isolation region formed between the first semiconductor layer and the first epitaxial layer, and a semiconductor element formed over each of the first semiconductor layer in the first region and the first epitaxial layer in the second region. The first semiconductor layer and the first epitaxial layer is spaced apart from each other by 5 μm or more."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of manufacturing semiconductor device and semiconductor device","description":"A semiconductor device includes a supporting substrate, an insulating film formed in a first region over the supporting substrate, a first semiconductor layer formed over the insulating film, a first ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9761708","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9761708","citation_suggestion":"Patentable. \"Method of manufacturing semiconductor device and semiconductor device\" (US-9761708). https://patentable.app/patents/US-9761708","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9761708","json":"https://patentable.app/api/llm-context/US-9761708","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T13:35:39.245Z"}