{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9766541","patent":{"patent_number":"US-9766541","title":"Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound","assignee":null,"inventors":[],"filing_date":"2016-06-17T00:00:00.000Z","publication_date":"2017-09-19T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":16,"abstract":"A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0):Z01 to Z04 each independently represent a substituent having electron withdrawing properties, Rb21 and Rb22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0− represents an organic anion."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound","description":"A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base m","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9766541","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9766541","citation_suggestion":"Patentable. \"Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound\" (US-9766541). https://patentable.app/patents/US-9766541","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9766541","json":"https://patentable.app/api/llm-context/US-9766541","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T03:52:22.253Z"}