{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9768025","patent":{"patent_number":"US-9768025","title":"Semiconductor device and method of fabricating the same","assignee":null,"inventors":[],"filing_date":"2016-06-16T00:00:00.000Z","publication_date":"2017-09-19T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"A method of fabricating a semiconductor device includes forming a target layer on a substrate, forming a plurality of reference patterns at uniform intervals on the target layer, forming a plurality of spacers on the side surfaces of the reference patterns, forming a plurality of filling patterns in spaces left between the spacers, forming a surface-modified filling pattern by performing a first surface treatment on a portion of the plurality of filling patterns, forming a surface-modified reference pattern by performing a second surface treatment on a portion of the plurality of reference patterns, and removing the plurality of filling patterns and the plurality of reference patterns and leaving the surface-modified filling pattern and the surface-modified reference pattern on the target layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor device and method of fabricating the same","description":"A method of fabricating a semiconductor device includes forming a target layer on a substrate, forming a plurality of reference patterns at uniform intervals on the target layer, forming a plurality o","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9768025","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9768025","citation_suggestion":"Patentable. \"Semiconductor device and method of fabricating the same\" (US-9768025). https://patentable.app/patents/US-9768025","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9768025","json":"https://patentable.app/api/llm-context/US-9768025","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T09:28:19.386Z"}