{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9773649","patent":{"patent_number":"US-9773649","title":"Dry development and image transfer of si-containing self-assembled block copolymers","assignee":null,"inventors":[],"filing_date":"2014-11-17T00:00:00.000Z","publication_date":"2017-09-26T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":24,"abstract":"Provided herein are methods of selectively etching silicon-containing block copolymer (BCP) materials. The methods involve exposing a BCP material that includes at least one silicon-containing block and at least one non-silicon-containing block to a plasma that has a reducing chemistry. The reducing plasma selectively removes the non-silicon-containing block, the silicon-containing block to be used in further processing. In some embodiments, the silicon-containing block is used as an etch mask. The reducing plasma reduces or eliminates profile bowing and undercut of the silicon-containing domains, allowing processing of high aspect ratio features. Examples of reducing chemistries include nitrogen (N2), hydrogen (H2), ammonia (NH3), hydrazine (N2H4), and mixtures thereof. Also provided are apparatuses to perform the methods."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Dry development and image transfer of si-containing self-assembled block copolymers","description":"Provided herein are methods of selectively etching silicon-containing block copolymer (BCP) materials. The methods involve exposing a BCP material that includes at least one silicon-containing block a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9773649","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9773649","citation_suggestion":"Patentable. \"Dry development and image transfer of si-containing self-assembled block copolymers\" (US-9773649). https://patentable.app/patents/US-9773649","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9773649","json":"https://patentable.app/api/llm-context/US-9773649","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T12:04:22.104Z"}