{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9773836","patent":{"patent_number":"US-9773836","title":"Method and functional architecture for inline repair of defective lithographically masked layers","assignee":null,"inventors":[],"filing_date":"2016-12-09T00:00:00.000Z","publication_date":"2017-09-26T00:00:00.000Z","cpc_codes":["H01L","G02F","G02F"],"num_claims":20,"abstract":"A method of manufacturing an sensor array includes providing a glass substrate; forming a bottom electrode layer over the glass substrate; forming a sensor material layer over the bottom electrode layer; forming a top electrode layer over the sensor material layer; patterning the top electrode layer, the sensor material layer, and the bottom electrode layer using a first photoresist layer to form a plurality of pixels; detecting a defect in the plurality of pixels; and patterning the plurality of pixels using a second photoresist layer. The first photoresist layer includes a plurality of first pixel patterns and the second photoresist layer comprises a plurality of second pixel patterns, and wherein at least one of the second pixel patterns has an area greater than that of a corresponding first pixel pattern."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and functional architecture for inline repair of defective lithographically masked layers","description":"A method of manufacturing an sensor array includes providing a glass substrate; forming a bottom electrode layer over the glass substrate; forming a sensor material layer over the bottom electrode lay","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9773836","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9773836","citation_suggestion":"Patentable. \"Method and functional architecture for inline repair of defective lithographically masked layers\" (US-9773836). https://patentable.app/patents/US-9773836","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9773836","json":"https://patentable.app/api/llm-context/US-9773836","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T14:40:35.556Z"}