{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9778569","patent":{"patent_number":"US-9778569","title":"Positive photosensitive resin composition, method for producing film using same, and electronic component","assignee":null,"inventors":[],"filing_date":"2014-10-24T00:00:00.000Z","publication_date":"2017-10-03T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":27,"abstract":"A positive photosensitive resin composition according to the present invention contains at least (A) a polysiloxane compound having at least a structural unit of the general formula (1), (B) a photoacid generator or quinone diazide compound and (C) a solvent[(RX)bR1mSiOn/2]  (1)where RX represents the following group; R1 each represents a hydrogen atom, C1-C3 alkyl group, phenyl group, hydroxy group, C1-C3 alkoxy group or C1-C3 fluoroalkyl group; b represents an integer of 1 to 3; m represents an integer of 0 to 2; n represents an integer of 1 to 3; and b, m and n satisfy b+m+n=4,where X each represents a hydrogen atom or acid labile group; and a represents an integer of 1 to 5. It is possible by the use of this positive photosensitive resin composition to provide a film with high resistance and heat-resistant transparency and provide an electronic component with such a film."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Positive photosensitive resin composition, method for producing film using same, and electronic component","description":"A positive photosensitive resin composition according to the present invention contains at least (A) a polysiloxane compound having at least a structural unit of the general formula (1), (B) a photoac","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9778569","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9778569","citation_suggestion":"Patentable. \"Positive photosensitive resin composition, method for producing film using same, and electronic component\" (US-9778569). https://patentable.app/patents/US-9778569","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9778569","json":"https://patentable.app/api/llm-context/US-9778569","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T19:50:22.571Z"}