{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9779985","patent":{"patent_number":"US-9779985","title":"Method for making patterns by self-assembly of block copolymers","assignee":null,"inventors":[],"filing_date":"2015-05-21T00:00:00.000Z","publication_date":"2017-10-03T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":11,"abstract":"A method for making patterns includes forming on a substrate surface a first mask delimiting at least two areas to be metallised; forming an assembly guide above the first mask, the assembly guide delimiting a surface covering two contact areas belonging respectively to the two areas to be metallised; depositing on the surface a block copolymer layer; reorganising the block copolymer layer; eliminating one of the phases of the reorganised block copolymer layer, resulting in a plurality of holes extending into the block copolymer layer above the two contact areas and a portion of the first mask arranged between the two contact areas; widening the holes of the block copolymer layer until a continuous trench is formed above the two contact areas and the portion of the first mask; transferring, through the first mask, the continuous trench onto the surface of the substrate to form patterns corresponding to the contact areas."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for making patterns by self-assembly of block copolymers","description":"A method for making patterns includes forming on a substrate surface a first mask delimiting at least two areas to be metallised; forming an assembly guide above the first mask, the assembly guide del","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9779985","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9779985","citation_suggestion":"Patentable. \"Method for making patterns by self-assembly of block copolymers\" (US-9779985). https://patentable.app/patents/US-9779985","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9779985","json":"https://patentable.app/api/llm-context/US-9779985","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:00:37.718Z"}