{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9780208","patent":{"patent_number":"US-9780208","title":"Method and structure of forming self-aligned RMG gate for VFET","assignee":null,"inventors":[],"filing_date":"2016-07-18T00:00:00.000Z","publication_date":"2017-10-03T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":19,"abstract":"An intermediate semiconductor structure in fabrication includes a silicon semiconductor substrate, a hard mask of silicon nitride (SiN) over the substrate and a sacrificial layer of polysilicon or amorphous silicon over the hard mask. The sacrificial layer is patterned into sidewall spacers, each of the sidewall spacers having vertically tapered inner and outer sidewalls providing a rough triangular shape. The rough triangular sidewall spacers are used as a temporary hard mask to pattern the SiN hard mask."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and structure of forming self-aligned RMG gate for VFET","description":"An intermediate semiconductor structure in fabrication includes a silicon semiconductor substrate, a hard mask of silicon nitride (SiN) over the substrate and a sacrificial layer of polysilicon or amo","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9780208","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9780208","citation_suggestion":"Patentable. \"Method and structure of forming self-aligned RMG gate for VFET\" (US-9780208). https://patentable.app/patents/US-9780208","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9780208","json":"https://patentable.app/api/llm-context/US-9780208","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T06:05:14.444Z"}