{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9785058","patent":{"patent_number":"US-9785058","title":"Method for ascertaining distortion properties of an optical system in a measurement system for microlithography","assignee":null,"inventors":[],"filing_date":"2015-08-13T00:00:00.000Z","publication_date":"2017-10-10T00:00:00.000Z","cpc_codes":["G01N"],"num_claims":10,"abstract":"A method for ascertaining distortion properties of an optical system in a measurement system for microlithography is provided, wherein the optical system images at least one structure to be measured into a measurement image. In accordance with one aspect, a method according to the invention comprises the following steps: measuring the field-dependent image aberrations of the optical system; determining a first distortion pattern present in the first image field generated by the optical system during measurement of at least one predefined structure; carrying out an optical forward simulation for the predefined structure taking account of the field-dependent image aberrations measured previously, with a second image field being generated; determining a second distortion pattern for the second image field generated previously; and ascertaining the structure-independent distortion properties of the optical system by calculating a third distortion pattern as the difference between the first distortion pattern and the second distortion pattern."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for ascertaining distortion properties of an optical system in a measurement system for microlithography","description":"A method for ascertaining distortion properties of an optical system in a measurement system for microlithography is provided, wherein the optical system images at least one structure to be measured i","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9785058","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9785058","citation_suggestion":"Patentable. \"Method for ascertaining distortion properties of an optical system in a measurement system for microlithography\" (US-9785058). https://patentable.app/patents/US-9785058","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9785058","json":"https://patentable.app/api/llm-context/US-9785058","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:58:58.786Z"}