{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9793339","patent":{"patent_number":"US-9793339","title":"Method for preventing copper contamination in metal-insulator-metal (MIM) capacitors","assignee":null,"inventors":[],"filing_date":"2015-01-08T00:00:00.000Z","publication_date":"2017-10-17T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":19,"abstract":"The present disclosure relates to a MIM capacitor that includes a composite capacitor top metal (CTM) electrode and a composite capacitor bottom metal (CBM) electrode. The composite CBM electrode includes a first diffusion barrier layer overlying a first metal layer, and the composite CTM electrode includes a second diffusion barrier layer overlying a second metal layer. A dielectric layer is arranged over the composite CBM electrode, underlying the composite CTM electrode. The first and second diffusion barrier layers protect the first and second metal layers from metal that diffuses or moves from a metal line underlying the MIM capacitor to the composite CTM and CBM electrodes during manufacture. A method of manufacturing the MIM capacitor is also provided."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for preventing copper contamination in metal-insulator-metal (MIM) capacitors","description":"The present disclosure relates to a MIM capacitor that includes a composite capacitor top metal (CTM) electrode and a composite capacitor bottom metal (CBM) electrode. The composite CBM electrode incl","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9793339","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9793339","citation_suggestion":"Patentable. \"Method for preventing copper contamination in metal-insulator-metal (MIM) capacitors\" (US-9793339). https://patentable.app/patents/US-9793339","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9793339","json":"https://patentable.app/api/llm-context/US-9793339","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:02:30.354Z"}