{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9793410","patent":{"patent_number":"US-9793410","title":"Method for manufacturing semiconductor device and manufacturing apparatus of semiconductor device","assignee":null,"inventors":[],"filing_date":"2016-09-26T00:00:00.000Z","publication_date":"2017-10-17T00:00:00.000Z","cpc_codes":["G02F","H01L","H01L","G02F","G02F","G02F","G02F","G02F","G02F","G02F","G02F","G02F","G02F","G02F","G02F","G02F","G06F","G06F","G06F","H01L"],"num_claims":23,"abstract":"A semiconductor device including an oxide semiconductor and an organic resin film is manufactured in the following manner. Heat treatment is performed on a first substrate provided with an organic resin film over a transistor including an oxide semiconductor in a reduced pressure atmosphere; handling of the first substrate is performed in an atmosphere containing moisture as little as possible in an inert gas (e.g., nitrogen) atmosphere with a dew point of lower than or equal to −60° C., preferably with a dew point of lower than or equal to −75° C. without exposing the first substrate after the heat treatment to the air; and then, the first substrate is bonded to a second substrate that serves as an opposite substrate."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for manufacturing semiconductor device and manufacturing apparatus of semiconductor device","description":"A semiconductor device including an oxide semiconductor and an organic resin film is manufactured in the following manner. Heat treatment is performed on a first substrate provided with an organic res","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9793410","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9793410","citation_suggestion":"Patentable. \"Method for manufacturing semiconductor device and manufacturing apparatus of semiconductor device\" (US-9793410). https://patentable.app/patents/US-9793410","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9793410","json":"https://patentable.app/api/llm-context/US-9793410","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T11:21:10.885Z"}