{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9809601","patent":{"patent_number":"US-9809601","title":"Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method","assignee":null,"inventors":[],"filing_date":"2014-02-04T00:00:00.000Z","publication_date":"2017-11-07T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":16,"abstract":"The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1).(in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.)."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method","description":"The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1).(in formula (1), each X ind","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9809601","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9809601","citation_suggestion":"Patentable. \"Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method\" (US-9809601). https://patentable.app/patents/US-9809601","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9809601","json":"https://patentable.app/api/llm-context/US-9809601","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T13:17:04.180Z"}