{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9812364","patent":{"patent_number":"US-9812364","title":"Method of fabricating semiconductor device with an overlay mask pattern","assignee":null,"inventors":[],"filing_date":"2016-06-16T00:00:00.000Z","publication_date":"2017-11-07T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"The disclosure relates to methods of fabricating semiconductor devices. A method of fabricating a semiconductor device is provided as follows. A target layer is formed. A hard mask layer is formed on the target layer. The hard mask layer is patterned to form an overlay mask pattern including a first mask pattern and a plateau-shaped mask pattern. The first mask pattern encloses the plateau-shaped mask pattern. The first mask pattern is spaced apart from the plateau-shaped mask pattern. The target layer is patterned using the overlay mask pattern to form a redundant fin and a plateau-shaped overlay mark. The redundant fin is removed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of fabricating semiconductor device with an overlay mask pattern","description":"The disclosure relates to methods of fabricating semiconductor devices. A method of fabricating a semiconductor device is provided as follows. A target layer is formed. A hard mask layer is formed on ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9812364","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9812364","citation_suggestion":"Patentable. \"Method of fabricating semiconductor device with an overlay mask pattern\" (US-9812364). https://patentable.app/patents/US-9812364","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9812364","json":"https://patentable.app/api/llm-context/US-9812364","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T17:28:19.516Z"}