{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9816944","patent":{"patent_number":"US-9816944","title":"Method for evaluating oxide semiconductor thin film, method for managing quality of oxide semiconductor thin film, and evaluation element and evaluation device used in above evaluation method","assignee":null,"inventors":[],"filing_date":"2014-12-01T00:00:00.000Z","publication_date":"2017-11-14T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N","G01N","H01L","H01L"],"num_claims":20,"abstract":"The present invention provides a method for accurately and easily measuring/evaluating/predicting/estimating the electrical resistance of an oxide semiconductor thin film, and a method for managing the film quality. The method for evaluating an oxide semiconductor thin film includes: a first step for irradiating, with excitation light and microwave, a sample on which an oxide semiconductor thin film is formed, measuring the maximum value of the reflected microwave by the thin film which changes due to the excitation light irradiation, then stopping the excitation light irradiation and measuring the change in reflectivity of the microwave from the thin film after the excitation light irradiation has been stopped; and a second step for calculating a parameter corresponding to the slow decay observed after the excitation light irradiation has been stopped from the change in the reflectivity and evaluating the electrical resistivity of the oxide semiconductor thin film."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for evaluating oxide semiconductor thin film, method for managing quality of oxide semiconductor thin film, and evaluation element and evaluation device used in above evaluation method","description":"The present invention provides a method for accurately and easily measuring/evaluating/predicting/estimating the electrical resistance of an oxide semiconductor thin film, and a method for managing th","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9816944","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9816944","citation_suggestion":"Patentable. \"Method for evaluating oxide semiconductor thin film, method for managing quality of oxide semiconductor thin film, and evaluation element and evaluation device used in above evaluation method\" (US-9816944). https://patentable.app/patents/US-9816944","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9816944","json":"https://patentable.app/api/llm-context/US-9816944","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T06:08:40.512Z"}