{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9817392","patent":{"patent_number":"US-9817392","title":"Photolithography systems and associated methods of overlay error correction","assignee":null,"inventors":[],"filing_date":"2015-11-19T00:00:00.000Z","publication_date":"2017-11-14T00:00:00.000Z","cpc_codes":["G05B","G05B","G05B","G05B"],"num_claims":16,"abstract":"Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a photolithography system includes measuring a plurality of first overlay errors that individually correspond to a microelectronic substrate in a first batch of microelectronic substrates. The method also includes determining a relationship between the first overlay errors and a first sequence of the microelectronic substrates in the first batch. The method further includes correcting a second overlay error of individual microelectronic substrates in a second batch based on a second sequence of the microelectronic substrates in the second batch and the determined relationship."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Photolithography systems and associated methods of overlay error correction","description":"Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a photolithography","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9817392","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9817392","citation_suggestion":"Patentable. \"Photolithography systems and associated methods of overlay error correction\" (US-9817392). https://patentable.app/patents/US-9817392","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9817392","json":"https://patentable.app/api/llm-context/US-9817392","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T15:34:08.068Z"}