{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9821348","patent":{"patent_number":"US-9821348","title":"Method and apparatus for water edge exposure and backside cleaning","assignee":null,"inventors":[],"filing_date":"2013-10-22T00:00:00.000Z","publication_date":"2017-11-21T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":20,"abstract":"A method for cleaning an edge of a semiconductor wafer in a wafer edge exposure (WEE) apparatus includes positioning the semiconductor wafer having a resist thereon in a wafer positioning device. A brush bar is positioned adjacent a backside of the semiconductor wafer in the wafer positioning device. The brush bar engages and cleans a backside of the semiconductor wafer while the semiconductor wafer is disposed in the wafer positioning device. A height of an edge of the semiconductor wafer is detected. The focusing position of exposure light radiated toward the edge is controlled on the basis of a height of the edge. Exposure light is radiated towards an edge after the cleaning step."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and apparatus for water edge exposure and backside cleaning","description":"A method for cleaning an edge of a semiconductor wafer in a wafer edge exposure (WEE) apparatus includes positioning the semiconductor wafer having a resist thereon in a wafer positioning device. A br","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9821348","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9821348","citation_suggestion":"Patentable. \"Method and apparatus for water edge exposure and backside cleaning\" (US-9821348). https://patentable.app/patents/US-9821348","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9821348","json":"https://patentable.app/api/llm-context/US-9821348","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:20:24.528Z"}