{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9828574","patent":{"patent_number":"US-9828574","title":"Cleaning composition and method for cleaning semiconductor wafers after CMP","assignee":null,"inventors":[],"filing_date":"2016-01-12T00:00:00.000Z","publication_date":"2017-11-28T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":19,"abstract":"The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Cleaning composition and method for cleaning semiconductor wafers after CMP","description":"The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydr","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9828574","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9828574","citation_suggestion":"Patentable. \"Cleaning composition and method for cleaning semiconductor wafers after CMP\" (US-9828574). https://patentable.app/patents/US-9828574","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9828574","json":"https://patentable.app/api/llm-context/US-9828574","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:59:29.523Z"}