{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9831098","patent":{"patent_number":"US-9831098","title":"Methods for fabricating integrated circuits using flowable chemical vapor deposition techniques with low-temperature thermal annealing","assignee":null,"inventors":[],"filing_date":"2015-07-13T00:00:00.000Z","publication_date":"2017-11-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes forming an isolation trench between two fin structures on an integrated circuit substrate, forming a flowable film in the isolation trench using a flowable chemical vapor deposition process, and annealing the flowable film to form a silicon oxide dielectric layer in the isolation trench. The annealing is performed at a temperature of less than about 200° C. with a process gas including N2 and H2O2."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods for fabricating integrated circuits using flowable chemical vapor deposition techniques with low-temperature thermal annealing","description":"Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes forming an isolation trench between two fin structures on an integrate","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9831098","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9831098","citation_suggestion":"Patentable. \"Methods for fabricating integrated circuits using flowable chemical vapor deposition techniques with low-temperature thermal annealing\" (US-9831098). https://patentable.app/patents/US-9831098","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9831098","json":"https://patentable.app/api/llm-context/US-9831098","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:17:09.213Z"}