{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9831099","patent":{"patent_number":"US-9831099","title":"Method and apparatus for multi-film deposition and etching in a batch processing system","assignee":null,"inventors":[],"filing_date":"2017-02-09T00:00:00.000Z","publication_date":"2017-11-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":19,"abstract":"Embodiments of the invention describe a method and apparatus for multi-film deposition and etching in a batch processing system. According to one embodiment, the method includes arranging the substrates on a plurality of substrate supports in a process chamber, where the process chamber contains processing spaces defined around an axis of rotation in the process chamber, rotating the plurality of substrate supports about the axis of rotation, depositing a first film on a patterned film on each of the substrates by atomic layer deposition, and etching a portion of the first film on each of the substrates, where etching a portion of the first film includes removing at least one horizontal portion of the first film while substantially leaving vertical portions of the first film. The method further includes repeating the depositing and etching steps for a second film that contains a different material than the first film."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and apparatus for multi-film deposition and etching in a batch processing system","description":"Embodiments of the invention describe a method and apparatus for multi-film deposition and etching in a batch processing system. According to one embodiment, the method includes arranging the substrat","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9831099","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9831099","citation_suggestion":"Patentable. \"Method and apparatus for multi-film deposition and etching in a batch processing system\" (US-9831099). https://patentable.app/patents/US-9831099","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9831099","json":"https://patentable.app/api/llm-context/US-9831099","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T06:59:33.606Z"}