{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9831314","patent":{"patent_number":"US-9831314","title":"Surface profile for semiconductor region","assignee":null,"inventors":[],"filing_date":"2015-08-03T00:00:00.000Z","publication_date":"2017-11-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":20,"abstract":"One or more techniques or systems for controlling a profile of a surface of a semiconductor region are provided herein. In some embodiments, an etching to deposition (E/D) ratio is set to be less than one to form the region within the semiconductor. For example, when the E/D ratio is less than one, an etching rate is less than a deposition rate of the E/D ratio, thus ‘growing’ the region. In some embodiments, the E/D ratio is subsequently set to be greater than one. For example, when the E/D ratio is greater than one, the etching rate is greater than the deposition rate of the E/D ratio, thus ‘etching’ the region. In this manner, a smooth surface profile is provided for the region, at least because setting the E/D ratio to be greater than one enables etch back of at least a portion of the grown region."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Surface profile for semiconductor region","description":"One or more techniques or systems for controlling a profile of a surface of a semiconductor region are provided herein. In some embodiments, an etching to deposition (E/D) ratio is set to be less than","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9831314","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9831314","citation_suggestion":"Patentable. \"Surface profile for semiconductor region\" (US-9831314). https://patentable.app/patents/US-9831314","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9831314","json":"https://patentable.app/api/llm-context/US-9831314","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T08:21:47.969Z"}