{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9837269","patent":{"patent_number":"US-9837269","title":"Deposition method for planar surfaces","assignee":null,"inventors":[],"filing_date":"2015-12-01T00:00:00.000Z","publication_date":"2017-12-05T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":12,"abstract":"A method for producing a substantially planar surface for semiconductor processing to improve lithography, planarization, and other process steps that benefit from a flat substrate. The method includes depositing a first alloy to form a first layer on a substrate. The first layer has a center high deposition, meaning the height in the center of the substrate is higher than the height at the edges of the substrate. The method further includes depositing a second alloy on the first layer to form a second layer. The first alloy has a different composition than the second alloy. In such a method the net deposition is substantially planar reducing or eliminating deposition induced long-range distortions that might occur across a substrate."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Deposition method for planar surfaces","description":"A method for producing a substantially planar surface for semiconductor processing to improve lithography, planarization, and other process steps that benefit from a flat substrate. The method include","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9837269","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9837269","citation_suggestion":"Patentable. \"Deposition method for planar surfaces\" (US-9837269). https://patentable.app/patents/US-9837269","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9837269","json":"https://patentable.app/api/llm-context/US-9837269","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T08:35:33.284Z"}