{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9837402","patent":{"patent_number":"US-9837402","title":"Method of concurrently forming source/drain and gate contacts and related device","assignee":null,"inventors":[],"filing_date":"2016-06-01T00:00:00.000Z","publication_date":"2017-12-05T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":14,"abstract":"A method of concurrently forming source/drain contacts (CAs) and gate contacts (CBs) and device are provided. Embodiments include forming metal gates (PC) and source/drain (S/D) regions over a substrate; forming an ILD over the PCs and S/D regions; forming a mask over the ILD; concurrently patterning the mask for formation of CAs adjacent a first portion of each PC and CBs over a second portion of the PCs; etching through the mask, forming trenches extending through the ILD down to a nitride capping layer formed over each PC and a trench silicide (TS) contact formed over each S/D region; selectively growing a metal capping layer over the TS contacts formed over the S/D regions; removing the nitride capping layer from the second portion of each PC; and metal filling the trenches, forming the CAs and CBs."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of concurrently forming source/drain and gate contacts and related device","description":"A method of concurrently forming source/drain contacts (CAs) and gate contacts (CBs) and device are provided. Embodiments include forming metal gates (PC) and source/drain (S/D) regions over a substra","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9837402","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9837402","citation_suggestion":"Patentable. \"Method of concurrently forming source/drain and gate contacts and related device\" (US-9837402). https://patentable.app/patents/US-9837402","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9837402","json":"https://patentable.app/api/llm-context/US-9837402","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T13:16:39.246Z"}