{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9842943","patent":{"patent_number":"US-9842943","title":"Method for manufacturing semiconductor device","assignee":null,"inventors":[],"filing_date":"2016-08-22T00:00:00.000Z","publication_date":"2017-12-12T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":11,"abstract":"Provided is a method for manufacturing a semiconductor device including a film to be treated having a high flatness. A semiconductor substrate having a surface and including a first region and a second region on the surface is prepared, the first region being a region in which a plurality of first level difference portions are formed, the second region being a region in which a plurality of second level difference portions arranged more sparsely than the plurality of first level difference portions are formed, or a region in which no level difference portion is formed. A photosensitive film is formed on a portion of the second region to surround a periphery of the first region as seen in plan view. An applied film having flowability is formed to cover the first region and the photosensitive film. A portion of the applied film at least on the first region is removed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for manufacturing semiconductor device","description":"Provided is a method for manufacturing a semiconductor device including a film to be treated having a high flatness. A semiconductor substrate having a surface and including a first region and a secon","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9842943","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9842943","citation_suggestion":"Patentable. \"Method for manufacturing semiconductor device\" (US-9842943). https://patentable.app/patents/US-9842943","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9842943","json":"https://patentable.app/api/llm-context/US-9842943","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T15:33:33.751Z"}