{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9847231","patent":{"patent_number":"US-9847231","title":"Method of etching","assignee":null,"inventors":[],"filing_date":"2016-11-15T00:00:00.000Z","publication_date":"2017-12-19T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":7,"abstract":"A method of etching an insulation layer on an object to be processed in a process chamber in which an upper electrode and a lower electrode are placed facing each other, includes supplying a process gas that includes fluorocarbon gas and silicon tetrafluoride (SiF4) gas into the process chamber; applying high frequency power to at least one of the upper electrode and the lower electrode, to generate plasma; and etching the insulation layer by the generated plasma via a mask."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of etching","description":"A method of etching an insulation layer on an object to be processed in a process chamber in which an upper electrode and a lower electrode are placed facing each other, includes supplying a process g","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9847231","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9847231","citation_suggestion":"Patentable. \"Method of etching\" (US-9847231). https://patentable.app/patents/US-9847231","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9847231","json":"https://patentable.app/api/llm-context/US-9847231","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T09:51:24.413Z"}