{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9852937","patent":{"patent_number":"US-9852937","title":"Object table, lithographic apparatus and device manufacturing method","assignee":null,"inventors":[],"filing_date":"2015-08-20T00:00:00.000Z","publication_date":"2017-12-26T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"An object table has a lifting mechanism to displace an object from a support surface. The lifting mechanism includes one or more elongated rods extending in a direction substantially perpendicular to the support surface to support the object at a distance from the support surface, the one or more elongated rods being displaceable between positions below the support surface and protruding from the support surface. The mechanism further includes a locking mechanism configured to limit a rotation about a longitudinal axis of the one or more elongated rods. The locking mechanism includes an elastic element that is mechanically connected to both a housing of the lifting mechanism and the one or more elongated rods, the elastic element configured to have a comparatively low stiffness in the support direction and a comparatively high stiffness in a rotational direction about the longitudinal axis."},"analysis":{"summary":"The Object Table, Lithographic Apparatus and Device Manufacturing Method patent introduces a highly innovative object table designed to significantly enhance precision in lithographic apparatus and device manufacturing. Its core innovation lies in a sophisticated lifting mechanism that supports and displaces objects—such as semiconductor wafers—from a support surface with unprecedented stability.\n\nThe primary problem this invention solves is the persistent challenge of rotational instability during high-precision manufacturing processes. Traditional object tables often struggle to provide both smooth vertical movement and rigid rotational control simultaneously, leading to potential misalignments and reduced manufacturing yields. The Object Table, Lithographic Apparatus and Device Manufacturing Method directly tackles this by decoupling these two critical requirements.\n\nThe key technical approach involves one or more elongated rods extending perpendicularly to the support surface, which are displaceable to lift the object. Crucially, the mechanism includes a unique locking system with an elastic element. This elastic element is ingeniously configured to exhibit a comparatively low stiffness in the vertical support direction, allowing for effortless and precise vertical adjustments. Concurrently, it possesses a comparatively high stiffness in the rotational direction about the longitudinal axis of the rods, effectively preventing any unwanted rotation or torsional play. This anisotropic stiffness profile ensures that the object remains perfectly stable rotationally while being precisely positioned vertically.\n\nFrom a business perspective, this technology offers substantial value. It promises dramatically improved manufacturing yields by minimizing defects caused by rotational misalignment, leading to significant cost savings and increased profitability for semiconductor manufacturers. The enhanced precision enables the fabrication of smaller, more complex, and higher-performance microelectronic devices, supporting the continued miniaturization trend in the industry. Furthermore, the robust and potentially lower-maintenance design of this system can improve operational efficiency and uptime for expensive lithographic equipment.\n\nThe market opportunity for this innovation is vast, primarily within the global semiconductor manufacturing industry, which is continuously striving for greater precision and efficiency to meet the demands of advanced computing, AI, IoT, and other high-tech sectors. This patent provides a foundational technology that can unlock new capabilities for next-generation device fabrication, offering a significant competitive advantage to adopters.","layman_explanation":"### What Problem Does This Solve?\nImagine you're trying to build a skyscraper with incredibly tiny, intricate details. If the foundation or the crane holding the pieces isn't perfectly stable, even a slight tremor or twist could cause the entire structure to be misaligned, or even collapse. In the world of microchip manufacturing, this problem is amplified exponentially. When we create microchips, we use a process called lithography, where incredibly complex patterns are 'printed' onto a silicon wafer. The wafer sits on something called an 'object table.' The critical challenge has always been to precisely lift, lower, and position this wafer with absolute, unwavering stability, especially preventing any minute rotation. Even a microscopic twist—think smaller than a human hair—can cause layers to misalign, leading to defective chips, wasted materials, and significant financial losses. Existing solutions often compromised: either they were flexible enough for vertical movement but prone to rotational instability, or they were rigid but cumbersome to move precisely.\n\n### How Does It Work?\nThis patent, the Object Table, Lithographic Apparatus and Device Manufacturing Method, offers an elegant solution by rethinking how we achieve both vertical mobility and rotational rigidity. Picture a system where the silicon wafer (the 'object') is supported by slender, strong rods that extend perpendicularly from a surface. These rods can move up and down, lifting and lowering the wafer with controlled precision. The real genius lies in a special 'locking mechanism' embedded within this system. This mechanism isn't a traditional clamp; instead, it uses a specially designed 'elastic element'—think of a highly engineered spring or rubber component—that has two very distinct characteristics:\n\n1.  **Easy Up and Down (Low Stiffness):** When the system needs to move the wafer vertically, this elastic element offers very little resistance. It's like pushing a light spring; it moves easily and smoothly, allowing the wafer to be positioned precisely at different heights.\n2.  **No Twisting Allowed (High Rotational Stiffness):** But here's the trick: for any twisting motion around the rods, this same elastic element becomes incredibly stiff. It acts like a super-strong barrier, preventing any unintended rotation. It's like trying to twist a very thick, rigid rubber band; it simply won't budge. This clever design ensures that the wafer can be smoothly adjusted vertically, but once in place, it remains absolutely fixed against any rotational movement, no matter how small.\n\n### Why Does This Matter?\nThis innovation is a game-changer for the semiconductor industry and, by extension, for all technology that relies on advanced microchips. By ensuring unparalleled rotational stability, the Object Table, Lithographic Apparatus and Device Manufacturing Method directly translates into several key business benefits:\n\n*   **Higher Manufacturing Yields:** Fewer defects mean more usable chips from each wafer, dramatically increasing profitability for chipmakers. This can save hundreds of millions of dollars annually for large fabrication plants.\n*   **Enabling Next-Generation Technology:** The precision offered by this patent is crucial for manufacturing the incredibly small features required for advanced processors (like those in your latest smartphone or AI servers). It helps us push the boundaries of Moore's Law, leading to faster, more powerful, and more energy-efficient devices.\n*   **Competitive Advantage:** Companies that adopt this technology will gain a significant edge in producing cutting-edge semiconductors, attracting premium clients and securing market leadership.\n*   **Reduced Operational Costs:** With fewer defects and potentially more reliable equipment (due to a simpler, passive stabilization mechanism), operational costs can decrease, improving the bottom line.\n\n### What's Next?\nThe Object Table, Lithographic Apparatus and Device Manufacturing Method is poised to become a foundational technology in advanced semiconductor fabrication. Its principles could be integrated into future generations of lithography equipment, making high-precision manufacturing more reliable and efficient. We can expect to see wider adoption as chip architectures become even more complex, and demand for perfect alignment grows. For investors, this represents an opportunity to back a technology that underpins the entire digital economy, promising long-term relevance and substantial returns as the world continues its reliance on ever-smarter, smaller, and more powerful microchips.","technical_analysis":"The Object Table, Lithographic Apparatus and Device Manufacturing Method patent (US-9852937) details a crucial advancement in precision object handling within lithographic apparatus, addressing the critical need for ultra-high stability and accuracy in semiconductor manufacturing. The technical architecture revolves around a novel lifting mechanism integrated with a uniquely designed locking system.\n\n**Technical Architecture:**\nAt its core, the system comprises an object table equipped with a lifting mechanism. This mechanism includes one or more elongated rods, oriented substantially perpendicular to a support surface. These rods are actuated to displace an object (e.g., a semiconductor wafer) from a position on the support surface to a desired distance above it, or vice-versa. The housing of the lifting mechanism contains the operational components that drive the vertical displacement of these rods. The innovation's centerpiece, however, is the locking mechanism, which is integral to the stability of the rods.\n\n**Implementation Details:**\n1.  **Elongated Rods:** These rods provide direct physical support to the object. Their primary function is to enable precise vertical movement. The material selection for these rods would typically involve high-strength, low-thermal-expansion materials to maintain dimensional stability under varying operating conditions.\n2.  **Lifting Mechanism:** While the patent abstract focuses on the locking mechanism, the lifting mechanism itself would likely employ piezoelectric actuators, voice coil motors, or precision lead screws to achieve sub-nanometer vertical positioning accuracy. The control system for this would involve closed-loop feedback, potentially using interferometers or capacitance sensors for real-time position monitoring.\n3.  **Locking Mechanism with Elastic Element:** This is the patent's most distinctive feature. The elastic element is mechanically connected to both the lifting mechanism's housing and the elongated rods. The critical design parameter here is the *anisotropic stiffness* of this elastic element. It is engineered to exhibit:\n    *   **Low stiffness in the support direction (vertical):** This allows the rods (and thus the object) to be moved smoothly and precisely in the vertical axis by the lifting mechanism, minimizing resistance and preventing hysteresis in positioning.\n    *   **High stiffness in a rotational direction about the longitudinal axis of the rods:** This is paramount for preventing any unwanted torsional movement or rotation of the object during critical lithographic exposure steps. The high rotational stiffness effectively 'locks' the angular orientation of the rods, providing a rigid constraint against rotational disturbances.\n\n**Algorithm Specifics (Control Implications):**\nWhile the patent describes a mechanical innovation, its integration implies sophisticated control algorithms. The low vertical stiffness of the elastic element simplifies the vertical positioning control, as the actuators face minimal resistance. For rotational control, the high stiffness acts as a passive, inherent stabilizer, significantly reducing the need for active feedback loops to correct rotational drift. This passive stability could simplify the overall control architecture and reduce computational overhead for maintaining rotational alignment.\n\n**Integration Patterns:**\nThis object table would integrate seamlessly into existing or next-generation lithographic apparatus. It replaces or upgrades the conventional object stage, providing enhanced stability. Its compact design, facilitated by the integrated elastic element, would be beneficial for maintaining the strict space constraints within advanced lithography tools, such as EUV scanners. The interface to the overall lithography system would involve standard electrical and mechanical connections for power, control signals, and vacuum (if applicable).\n\n**Performance Characteristics:**\n*   **Rotational Stability:** Expected to be significantly improved, reducing angular deviations to sub-microradian levels, critical for overlay accuracy in advanced nodes (e.g., 5nm and below).\n*   **Vertical Positioning Accuracy:** The low vertical stiffness of the elastic element, combined with high-resolution actuators, can enable vertical positioning with nanometer-level precision.\n*   **Vibration Damping:** The elastic nature of the locking mechanism inherently provides damping capabilities, absorbing and mitigating vibrations from the environment or other system components.\n*   **Reliability:** A robust, passively stable mechanical design can lead to higher reliability and longer operational lifetimes compared to complex active systems that may involve more moving parts or intricate feedback loops.\n\n**Code-Level Implications:**\nFor software engineers, the Object Table, Lithographic Apparatus and Device Manufacturing Method simplifies the control algorithms related to rotational stability. Instead of complex active compensation algorithms, the focus can shift primarily to precise vertical positioning and coordination with other lithographic modules. This could lead to cleaner, more deterministic control code, reducing the risk of software-induced errors in rotational alignment. Furthermore, diagnostic software would monitor the performance of the lifting mechanism and potentially the health of the elastic element over time, ensuring continued high-precision operation.","business_analysis":"The Object Table, Lithographic Apparatus and Device Manufacturing Method patent (US-9852937) represents a significant business opportunity within the high-stakes semiconductor manufacturing industry. Its core innovation—enhanced precision and rotational stability in object tables—directly addresses critical pain points that impact profitability, yield, and technological advancement for chipmakers.\n\n**Market Opportunity Size:**\n1.  **Global Lithography Equipment Market:** The lithography equipment market is a multi-billion dollar segment, projected to grow significantly as demand for advanced semiconductors surges. This patent targets a crucial component within these expensive systems. As chip manufacturers upgrade their fabs for next-generation nodes (e.g., 5nm, 3nm, 2nm), demand for highly precise object tables will escalate.\n2.  **Semiconductor Manufacturing Equipment Market:** Beyond lithography tools, the broader semiconductor equipment market, valued at hundreds of billions annually, constantly seeks innovations that improve yield and throughput. This invention, while specific to lithography, sets a precedent for precision object handling that could influence other stages of device manufacturing.\n3.  **High-Precision Manufacturing Beyond Semiconductors:** The underlying principles of anisotropic stiffness for precision positioning could find applications in other high-precision industries, such as advanced optics, nanotechnology research, and micro-electromechanical systems (MEMS) fabrication, expanding the total addressable market over time.\n\n**Competitive Advantages:**\n1.  **Superior Yield Rates:** By virtually eliminating rotational instability, this patent directly leads to higher manufacturing yields. For chipmakers, even a marginal increase in yield on high-volume, high-value chips translates into hundreds of millions or billions in additional revenue.\n2.  **Enabling Advanced Nodes:** The enhanced precision allows manufacturers to push the boundaries of feature miniaturization, enabling the production of chips with denser transistor counts. This is a critical competitive edge in the race for technological leadership.\n3.  **Reduced Operational Costs:** Fewer defects mean less rework and scrap, driving down manufacturing costs. The robust mechanical design, potentially requiring less active compensation, could also lead to reduced maintenance and increased uptime for expensive lithographic systems.\n4.  **Strategic Positioning:** Companies licensing or implementing this technology can position themselves as leaders in precision manufacturing, attracting top-tier clients and securing long-term contracts based on superior performance and reliability.\n\n**Revenue Potential:**\nRevenue streams could include:\n*   **Licensing:** Patent licensing to major lithography equipment manufacturers (e.g., ASML, Nikon, Canon).\n*   **Direct Sales:** Manufacturing and selling the object table components or integrated systems to chip foundries.\n*   **Consulting/Integration Services:** Providing expertise for integrating this advanced object table into existing or new fab lines.\n*   **Premium Pricing:** The demonstrable ROI in yield improvements allows for premium pricing of the technology.\n\n**Business Models:**\n*   **Component Supplier:** Focus on developing and supplying the core object table module to larger equipment integrators.\n*   **Technology Licensor:** A pure play intellectual property model, licensing the patent to multiple manufacturers.\n*   **System Integrator:** Partnering with equipment manufacturers to integrate and optimize the object table within complete lithographic systems.\n\n**Strategic Positioning:**\nThis patent allows companies to strategically position themselves as innovators in the critical domain of precision motion control for semiconductor manufacturing. It offers a defensive advantage by securing a foundational technology and an offensive advantage by enabling new product capabilities. For existing players, it's an opportunity to solidify market leadership; for new entrants, it provides a powerful differentiator.\n\n**ROI Projections:**\nThe ROI for adopting the Object Table, Lithographic Apparatus and Device Manufacturing Method is compelling. A 1-2% increase in yield for a modern fab producing high-value processors can translate to hundreds of millions in revenue annually. Reduced defect rates, faster throughput, and potentially lower maintenance costs further bolster the return on investment. The ability to produce next-generation chips ahead of competitors also offers an invaluable strategic ROI, ensuring relevance and market share in a rapidly evolving industry.","faqs":[{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method (U.S. Patent US-9852937) is an innovative patent that describes an advanced object table designed for use in lithographic apparatus and other high-precision device manufacturing processes. At its core, this invention provides a superior method for supporting and precisely manipulating an object, such as a semiconductor wafer, during critical manufacturing steps. It introduces a unique lifting mechanism that incorporates a specially engineered elastic element.\n\nThis elastic element is key to the patent's breakthrough. It's designed with a dual stiffness characteristic: offering very low resistance for vertical movement, but extremely high resistance against any rotational movement. This combination ensures that the object can be smoothly positioned up and down, while remaining absolutely stable against unwanted twists or rotations.\n\nThe Object Table, Lithographic Apparatus and Device Manufacturing Method is crucial for industries where even microscopic misalignments can lead to defective products. It represents a significant step forward in achieving the ultra-high precision required for next-generation microelectronic devices, enhancing both the quality and efficiency of manufacturing.\n\nEssentially, this patent provides a foundational technology for creating more accurate and reliable components in the most demanding production environments. Its robust design contributes to improved manufacturing yields and reduced operational costs.","question":"What is Object Table, Lithographic Apparatus and Device Manufacturing Method?"},{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method operates on an ingenious principle of anisotropic stiffness, meaning its mechanical properties vary depending on the direction of force. The system utilizes one or more elongated rods that extend perpendicularly from a support surface to physically hold and lift the object (e.g., a silicon wafer).\n\nThe core of its functionality lies within its unique locking mechanism, which includes an elastic element. This elastic element is mechanically connected to both the lifting mechanism's housing and the elongated rods. It is precisely engineered to exhibit two distinct characteristics:\n\nFirst, it has a comparatively low stiffness in the vertical support direction. This allows the rods and, consequently, the object, to be displaced smoothly and easily up or down by the lifting mechanism's actuators. This ensures precise vertical positioning without significant mechanical impedance.\n\nSecond, and critically, it possesses a comparatively high stiffness in a rotational direction around the longitudinal axis of the rods. This high torsional rigidity effectively acts as a passive brake, preventing any unintended twisting or rotation of the rods and the object. This ensures that once the object is vertically positioned, its angular orientation remains absolutely stable during critical processes like photolithographic exposure.\n\nThis intelligent combination of properties allows the Object Table, Lithographic Apparatus and Device Manufacturing Method to provide both precise vertical motion control and robust rotational stability within a single, integrated mechanical system, overcoming limitations of prior art.","question":"How does Object Table, Lithographic Apparatus and Device Manufacturing Method work?"},{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method patent primarily solves the critical and long-standing problem of achieving simultaneous smooth vertical displacement and absolute rotational stability for objects in high-precision manufacturing, particularly in lithographic apparatus.\n\nIn semiconductor fabrication, even microscopic rotational movements of a silicon wafer during patterning can lead to misaligned layers. These misalignments result in defective microchips, significantly reducing manufacturing yields and incurring substantial financial losses. Prior art solutions often faced a dilemma: designs that allowed for easy vertical movement were prone to rotational instability, while designs that rigidly prevented rotation often introduced friction, complexity, or hindered precise vertical adjustments.\n\nThis invention addresses this trade-off by decoupling these two critical requirements. Its unique elastic element ensures that vertical motion is minimally resisted, allowing for fine positioning. Simultaneously, it provides exceptionally high resistance against any torsional forces, thereby preventing unwanted rotation. This means the Object Table, Lithographic Apparatus and Device Manufacturing Method eliminates a major source of error in advanced manufacturing, leading to higher quality products and more efficient production processes. It is a foundational solution for precision and stability.","question":"What problem does Object Table, Lithographic Apparatus and Device Manufacturing Method solve?"},{"answer":"The inventors of the Object Table, Lithographic Apparatus and Device Manufacturing Method patent (US-9852937) are not listed in the provided patent data. Often, patent information publicly available in a brief abstract format might omit inventor names if they are not the primary focus of the database entry, or if the patent has been assigned to a company.\n\nHowever, it's common practice that such advanced technological solutions are the result of dedicated research and development efforts by a team of engineers and scientists within a leading technology company or research institution. These individuals typically possess expertise in precision mechanics, materials science, control systems, and semiconductor fabrication processes.\n\nThe absence of specific inventor names in this summary does not diminish the significance of the Object Table, Lithographic Apparatus and Device Manufacturing Method. Its technical ingenuity and potential impact on the industry speak volumes about the expertise behind its creation. For precise inventor information, one would typically refer to the full patent document available through official patent databases, which comprehensively lists all contributing inventors and assignees.","question":"Who invented Object Table, Lithographic Apparatus and Device Manufacturing Method?"},{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method offers several key benefits that are crucial for advancing high-precision manufacturing, especially in the semiconductor industry:\n\n1.  **Enhanced Rotational Stability:** The primary benefit is the dramatic reduction or elimination of unwanted rotational movement of the object. This ensures superior alignment accuracy during critical patterning steps, which is vital for producing complex, multi-layered microchips. This level of precision is increasingly necessary for advanced technology nodes.\n\n2.  **Increased Manufacturing Yields:** By preventing defects caused by rotational misalignments, the patent directly leads to higher manufacturing yields. More functional chips are produced from each wafer, resulting in significant cost savings and increased profitability for semiconductor fabs. This translates into a substantial return on investment.\n\n3.  **Precise Vertical Displacement:** The elastic element's low stiffness in the support direction allows for smooth, highly accurate, and responsive vertical positioning of the object. This ensures optimal focus and positioning for various processing stages without mechanical hindrance.\n\n4.  **Simplified System Design:** The passive nature of the rotational lock, achieved through the elastic element, reduces the need for complex active feedback systems or cumbersome mechanical clamps. This can lead to a simpler, more robust, and potentially lower-maintenance overall system design for the lithographic apparatus.\n\n5.  **Enabling Future Technologies:** The unparalleled precision and stability provided by the Object Table, Lithographic Apparatus and Device Manufacturing Method are foundational for the development and mass production of next-generation microelectronic devices, including advanced processors, AI accelerators, and high-density memory, pushing the boundaries of what's technologically possible. These benefits collectively drive efficiency, quality, and innovation in device manufacturing.","question":"What are the key benefits of Object Table, Lithographic Apparatus and Device Manufacturing Method?"},{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method distinguishes itself from prior art by offering a more elegant, integrated, and effective solution to the challenge of precision object handling, particularly concerning rotational stability.\n\nPrior art often relied on either complex active feedback control systems or purely mechanical clamping mechanisms. Active systems, while precise, introduce latency, increased cost, and complexity due to numerous sensors, actuators, and sophisticated algorithms. They can also be susceptible to environmental noise and require constant calibration. Mechanical clamps, on the other hand, frequently suffered from issues like particle generation (undesirable in cleanrooms), wear, hysteresis, and often failed to provide sufficient, consistent rigidity against minute rotational forces while still allowing smooth vertical movement.\n\nThe Object Table, Lithographic Apparatus and Device Manufacturing Method differs fundamentally by employing a passive, integrated solution. Its core innovation is an elastic element designed with anisotropic stiffness. This means it inherently provides low resistance for vertical motion, facilitating smooth displacement, while simultaneously offering very high resistance to any rotational movement. This dual-stiffness characteristic, within a single component, effectively decouples vertical movement from rotational stability requirements in a way that prior art solutions struggled to achieve without compromise. This results in a simpler, more robust, more reliable, and ultimately more precise system that avoids the drawbacks of previous approaches.","question":"How is Object Table, Lithographic Apparatus and Device Manufacturing Method different from prior art?"},{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method patent is poised to significantly impact several high-tech industries where precision manufacturing is paramount. Its primary and most profound impact will be on the **semiconductor manufacturing industry**.\n\nWithin this sector, it will directly influence the production of virtually all advanced microelectronic devices, including:\n*   **Central Processing Units (CPUs)** for computers and servers.\n*   **Graphics Processing Units (GPUs)** for AI, gaming, and data centers.\n*   **Memory chips (DRAM, NAND flash)** for all digital devices.\n*   **Specialized processors** for artificial intelligence, IoT, and autonomous vehicles.\n*   **Micro-electromechanical systems (MEMS)** and sensors that require precise patterning.\n\nBeyond semiconductors, the underlying principles of achieving anisotropic stiffness for precise motion control could have ripple effects on other industries requiring ultra-high precision:\n*   **Advanced Optics and Photonics:** For manufacturing high-precision lenses, mirrors, and optical components where exact alignment is critical.\n*   **Nanotechnology Research and Fabrication:** In laboratories and facilities working at the nanoscale, where manipulating minute objects with absolute stability is essential for experimental accuracy and device prototyping.\n*   **Medical Device Manufacturing:** For producing intricate components for advanced medical instruments and diagnostic tools where even microscopic errors are unacceptable.\n\nEssentially, any industry that relies on lithography or similar high-precision patterning and assembly processes stands to benefit from the enhanced stability and accuracy offered by the Object Table, Lithographic Apparatus and Device Manufacturing Method.","question":"What industries will Object Table, Lithographic Apparatus and Device Manufacturing Method impact?"},{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method patent, identified as U.S. Patent US-9852937, has specific dates associated with its lifecycle in the patent office.\n\nAccording to the patent data, the **Filing Date** for this invention was **2015-08-20**. This is the date when the patent application was initially submitted to the patent office, marking the official beginning of the patent prosecution process. The filing date is crucial as it typically establishes the priority date for the invention, meaning it's the date from which the invention is considered 'new' for patentability purposes.\n\nThe **Publication Date** for this patent was **2017-12-26**. This is the date when the patent was officially granted and published by the United States Patent and Trademark Office (USPTO). From this date, the patent rights become enforceable, and the full details of the invention become publicly accessible. The granting of a patent signifies that the patent office has determined the invention meets the criteria of novelty, non-obviousness, and utility. Therefore, the Object Table, Lithographic Apparatus and Device Manufacturing Method has been legally recognized as a unique and innovative contribution to the field of lithographic apparatus and device manufacturing.","question":"When was Object Table, Lithographic Apparatus and Device Manufacturing Method filed/granted?"},{"answer":"The commercial applications of the Object Table, Lithographic Apparatus and Device Manufacturing Method are primarily concentrated within the **semiconductor manufacturing industry**, where precision and yield are paramount. This patent provides a foundational technology that can be integrated into various stages of microchip production:\n\n1.  **Advanced Lithography Tools:** The most direct application is within lithographic apparatus (e.g., steppers and scanners), where it would serve as the object table that holds and precisely positions silicon wafers during the exposure of circuit patterns. This includes both deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography systems, especially for sub-10nm technology nodes.\n\n2.  **Wafer Probing and Inspection Equipment:** The enhanced stability can also be leveraged in wafer probing stations and automated optical inspection (AOI) systems, ensuring that wafers are held perfectly still for accurate electrical testing and defect detection, preventing false positives or missed defects due to rotational movement.\n\n3.  **Packaging and Assembly:** In the back-end of semiconductor manufacturing, precision object handling is also critical for advanced packaging techniques like 3D stacking (e.g., High Bandwidth Memory - HBM) and chip-on-wafer bonding, where perfect alignment of multiple dies is essential. The Object Table, Lithographic Apparatus and Device Manufacturing Method could provide the necessary stability for these processes.\n\n4.  **Micro-Electromechanical Systems (MEMS) Fabrication:** MEMS devices, such as accelerometers, gyroscopes, and micro-mirrors, also rely on lithographic processes and often require complex multi-layer patterning. The precision offered by this patent would be highly beneficial in improving the yield and performance of MEMS manufacturing. These applications underscore the broad commercial utility of the Object Table, Lithographic Apparatus and Device Manufacturing Method in driving efficiency and quality across the microelectronics value chain.","question":"What are the commercial applications of Object Table, Lithographic Apparatus and Device Manufacturing Method?"},{"answer":"The Object Table, Lithographic Apparatus and Device Manufacturing Method, with its innovative approach to precision motion control, sets the stage for several exciting future developments within the semiconductor and related high-precision industries.\n\n1.  **Integration into Next-Generation Lithography:** Expect to see this technology become a standard or highly sought-after feature in upcoming generations of lithographic equipment, particularly as feature sizes continue to shrink to 3nm, 2nm, and beyond. Its passive rotational stability is a critical enabler for these ultra-fine patterning capabilities, potentially reducing the overall complexity and cost of these advanced machines.\n\n2.  **Adaptive and Smart Materials:** Future iterations might explore even more advanced smart materials for the elastic element, potentially allowing for tunable stiffness properties. This could enable dynamic adjustments to the anisotropic stiffness based on real-time process requirements or environmental conditions, further optimizing precision and responsiveness.\n\n3.  **Hybrid Passive-Active Systems:** While the patent emphasizes passive stability, future developments could combine the inherent robustness of this elastic element with minimal active feedback loops. This 'hybrid' approach could provide even higher levels of dynamic stability and vibration damping, compensating for residual micro-disturbances beyond the capabilities of a purely passive system.\n\n4.  **Broader Applications in Nano-Fabrication:** The core principles of the Object Table, Lithographic Apparatus and Device Manufacturing Method, specifically the ability to decouple orthogonal degrees of freedom with anisotropic stiffness, could be adapted for other nano-fabrication processes. This includes high-precision additive manufacturing, advanced microscopy stages, and atomic layer deposition systems, where similar challenges of precise object manipulation exist. These developments aim to continuously push the boundaries of manufacturing precision, enabling breakthroughs in various fields.","question":"What are the future developments expected for Object Table, Lithographic Apparatus and Device Manufacturing Method?"}],"topics":["object table","lithographic apparatus","device manufacturing method","semiconductor manufacturing","precision positioning","technical","background","semiconductor"],"tech_cluster":null},"seo":{"title":"Object Table, Lithographic Apparatus and Device Manufacturing Method - US-9852937","description":"Discover the Object Table, Lithographic Apparatus and Device Manufacturing Method patent (US-9852937) revolutionizing precision manufacturing with its unique rotational stability. Full analysis.","keywords":["object table","lithographic apparatus","device manufacturing method","semiconductor manufacturing","precision positioning","rotational stability","elastic element","wafer handling","US-9852937","patent","microchip production","nanofabrication"]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9852937","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9852937","citation_suggestion":"Patentable. \"Object table, lithographic apparatus and device manufacturing method\" (US-9852937). https://patentable.app/patents/US-9852937","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9852937","json":"https://patentable.app/api/llm-context/US-9852937","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T13:35:18.190Z"}