Multiple Electron Beam Image Acquisition Apparatus, and Alignment Method of Multiple Electron Beam Optical System

1. A multiple electron beam image acquisition apparatus comprising: an electromagnetic lens configured to receive incidence of multiple electron beams and refract them; an aberration corrector disposed adjacent to the electromagnetic lens and in a magnetic field of the electromagnetic lens, configured to receive incident of the multiple electron beams and configured to correct aberration of the multiple electron beams; an aperture substrate disposed movably at an upstream side of the aberration corrector with respect to an advancing direction of the multiple electron beams, and configured to selectively make an individual beam of the multiple electron beams pass therethrough independently; a stage configured to be movable and dispose thereon the aberration corrector; a stage control circuit configured, using an image caused by the individual beam which was selectively made to pass, to move the stage so that a position of the aberration corrector is aligned with respect to the multiple electron beams which have been relatively aligned with the electromagnetic lens, a position of the aberration corrector being moved by moving the stage; and a detector configured to detect multiple secondary electron beams emitted due to that a surface of a target object is irradiated with multiple electron beams having passed through the aberration corrector.

2. The apparatus according to claim 1 , wherein the aberration corrector individually corrects a trajectory of each of the multiple electron beams.

3. The apparatus according to claim 1 , wherein, in the aberration corrector, there are formed a plurality of first passage holes through each of which a corresponding one of the multiple electron beams individually passes, and a second passage hole through which all the multiple electron beams collectively pass.

4. The apparatus according to claim 1 , wherein the aberration corrector includes three or more stages of a plurality of electrode substrates.

5. The apparatus according to claim 4 , wherein, in each of the plurality of electrode substrates, there are formed a plurality of first passage holes through each of which a corresponding one of the multiple electron beams individually passes, and a second passage hole through which all the multiple electron beams collectively pass.

6. The apparatus according to claim 5 , wherein, on a middle one of the plurality of electrode substrates, there is disposed, for each of the plurality of first passage holes, a set of electrodes to sandwich a passing beam of the multiple electron beams.

7. The apparatus according to claim 6 , wherein the set of electrodes is composed of four or more electrodes.

8. The apparatus according to claim 6 , wherein a ground potential is applied to upper and lower ones of the plurality of electrode substrates.

9. An alignment method of multiple electron beam optical system comprising: performing alignment between an electromagnetic lens which receives incidence of multiple electron beams so as to refract them and the multiple electron beams, by shifting a beam trajectory of the multiple electron beams; and performing alignment between an aberration corrector configured to receive incident of the multiple electron beams and configured to correct aberration of the multiple electron beams and the multiple electron beams without changing the beam trajectory of the multiple electron beams, by moving a stage on which the aberration corrector arranged adjacent to the electromagnetic lens and in a magnetic field of the electromagnetic lens is disposed, a position of the aberration corrector being moved by moving the stage.

10. The method according to claim 9 , further comprising: selecting one beam of the multiple electron beams by selectively making the one beam pass through a hole which an individual beam of the multiple electron beams individually passes in an aperture substrate disposed at an upstream side of the aberration corrector with respect to an advancing direction of the multiple beams; and specifying a position of the aberration corrector by using the one beam selected, wherein alignment between the aberration corrector and the multiple electron beams is performed using information on the position of the aberration corrector having been specified.