Display Device Comprising A Transistor With LDD Regions

1. A display device comprising: a glass substrate; a first insulating layer comprising silicon oxide over the glass substrate; a second insulating layer comprising silicon nitride over the glass substrate; a semiconductor layer comprising polysilicon over the first insulating layer and the second insulating layer; a third insulating layer, provided over the semiconductor layer, comprising silicon oxide and functioning as a first gate insulating layer; a fourth insulating layer, provided over the third insulating layer, comprising silicon nitride and functioning as a second gate insulating layer; a gate electrode comprising molybdenum over the fourth insulating layer; an insulating interlayer film comprising any one of silicon oxide and silicon nitride over the gate electrode; a first conductive film provided in an opening of the insulating interlayer film, the first conductive film having a stacked-layer structure comprising aluminum and titanium; a fifth insulating film comprising a resin over and in contact with side surfaces and a top surface of the first conductive film and over and in contact with the insulating interlayer film; a second conductive film functioning as a pixel electrode over and electrically connected to the first conductive film through an opening provided in the fifth insulating film; and a light-blocking film overlapping the semiconductor layer, the gate electrode, and the pixel electrode, wherein the light-blocking film comprises a metal, wherein a bottom surface of the fifth insulating film is provided below a top surface of the gate electrode, wherein the second conductive film comprises a region overlapping the semiconductor layer, wherein the gate electrode comprises a region not overlapping with the second conductive film, wherein the second conductive film comprises indium tin oxide, wherein the gate electrode overlaps with a channel region of the semiconductor layer, and wherein the gate electrode has a tapered shape.

2. A display device comprising: a glass substrate; a first insulating layer comprising silicon oxide over the glass substrate; a second insulating layer comprising silicon nitride over the glass substrate; a semiconductor layer comprising polysilicon over the first insulating layer and the second insulating layer; a third insulating layer, provided over the semiconductor layer, comprising silicon oxide and functioning as a first gate insulating layer; a gate electrode comprising molybdenum over the third insulating layer; an insulating interlayer film comprising any one of silicon oxide and silicon nitride over the gate electrode; a first conductive film provided in an opening of the insulating interlayer film and the third insulating layer, the first conductive film having a stacked-layer structure comprising aluminum and titanium; an organic insulating film over and in contact with side surfaces and a top surface of the first conductive film and over and in contact with the insulating interlayer film; a second conductive film functioning as a pixel electrode over and electrically connected to the first conductive film through an opening provided in the fifth insulating film; and a light-blocking film overlapping the semiconductor layer, the gate electrode, and the pixel electrode, wherein the light-blocking film comprises a metal, wherein a bottom surface of the organic insulating film is provided below a top surface of the gate electrode, wherein the second conductive film comprises a region overlapping the semiconductor layer, wherein the gate electrode comprises a region not overlapping with the second conductive film, wherein the second conductive film comprises indium tin oxide, wherein the gate electrode overlaps with a channel region of the semiconductor layer, and wherein the gate electrode has a tapered shape.

3. The display device according to claim 1 , further comprising: a liquid crystal display element; and an insulating film over the second conductive film, wherein a region in the display device exists in which the glass substrate overlaps with the first insulating film, the second insulating film, the semiconductor layer, the first gate insulating layer, the insulating interlayer film, and the first conductive film without a layer comprising a metal provided therebetween.

4. The display device according to claim 2 , further comprising: a liquid crystal display element; and an insulating film over the second conductive film, wherein a region in the display device exists in which the glass substrate overlaps with the first insulating film, the second insulating film, the semiconductor layer, the first gate insulating layer, the insulating interlayer film, and the first conductive film without a layer comprising a metal provided therebetween.

5. The display device according to claim 1 , further comprising: a liquid crystal display element; an alignment film comprising a resin over the second conductive film; and a third conductive film comprising indium tin oxide over the second conductive film and the fifth insulating layer.

6. The display device according to claim 2 , further comprising: a liquid crystal display element; an alignment film comprising a resin over the second conductive film; and a third conductive film comprising indium tin oxide over the second conductive film and the organic insulating film.

7. The display device according to claim 3 , further comprising: a pair of LDD regions in the semiconductor layer.

8. The display device according to claim 4 , further comprising: a pair of LDD regions in the semiconductor layer.