Method for Inspecting Measurement Object

1. An inspection method for inspecting a device mounted on a substrate, comprising: generating a shape template of the device; acquiring shadow information of each pixel by projecting light onto the substrate in a plurality of directions; generating a shadow map by merging a plurality of shadow information taken in a plurality of directions; and comparing the shadow map with the shape template to acquire at least one information of a size, a position and a rotation of the device.

2. The inspection method of claim 1 , wherein acquiring shadow information of each pixel by projecting light onto the substrate in a plurality of directions, comprises: projecting grating pattern light onto the substrate in a plurality of directions N-times, while shifting a phase of the grating pattern light; and capturing N-number of images reflected by the substrate.

3. The inspection method of claim 2 , wherein acquiring shadow information of each pixel by projecting light onto the substrate in a plurality of directions, further comprises: averaging the N-number of images or summing up images in the N-number of images such that sum of phase differences of the images becomes 360 degrees, to get images in which grating pattern is removed.

4. An inspection method for a measurement object, comprising: acquiring shadow regions for each direction by projecting light onto a substrate, on which the measurement object is formed, in a plurality of directions; generating a shadow map by merging the acquired shadow regions for each direction; and acquiring at least one information of a size, a position and a rotation of the measurement object from the shadow map.

5. The inspection method of claim 4 , after acquiring shadow areas for each direction, further comprising compensating the acquired shadow regions for each direction, wherein compensating the acquired shadow regions for each direction is performed by multiplying amplitude ((Bi(x,y)) with each pixel of the acquired shadow regions for each direction, or setting up a pixel of the shadow regions to be a shadow when the amplitude of the pixel is no greater than a criterion that is previously set up.

6. The inspection method of claim 4 , after generating a shadow map, further comprising compensating the shadow map, wherein compensating the shadow map is performed by multiplying amplitude ((Bi(x,y)) with each pixel of the shadow map, or setting up a pixel of the shadow map to be a shadow when the amplitude of the pixel is no greater than a criterion that is previously set up.

7. The inspection method of claim 4 , further comprising: generating a template by measuring the measurement object using a measurement apparatus, or CAD data including information of the measurement object; and setting up the measurement object by comparing the shadow map with the template.

8. The inspection method of claim 4 , further comprising generating a shadow template that is abstracted from a shadow of the measurement object, wherein, in acquiring at least one information of a size, a position and a rotation of the measurement object from the shadow map, the information of the measurement object is acquired by comparing the shadow map with the shadow template.

9. The inspection method of claim 4 , in acquiring shadow areas for each direction, wherein visibility information or amplitude information for each pixel is acquired by projecting the light onto the substrate, on which the measurement object is formed, and the shadow regions for each direction is acquired from the visibility information or the amplitude information.

10. The inspection method of claim 9 , wherein the visibility is defined as a ratio of amplitude (B i (x,y)) to average (A i (x,y)) (or (Vi(x,y)=Bi(x,y)/Ai(x,y))) in intensity of image at each pixel, where the average (A i (x,y)) and the visibility (Vi(x,y)) are as follows: A i ⁡ ( x , y ) = I 1 i + I 2 i + I 3 i + I 4 i 4 V i ⁡ ( x , y ) = B i A i = 2 ⁢ ( I 1 i - I 3 i ) 2 + ( I 2 i - I 4 i ) 2 ( I 1 i + I 2 i + I 3 i + I 4 i ) (wherein I i 1 , I i 2 , . . . , I i N indicate N-number of intensity signals at a position i (x,y) in X-Y plane, which are extracted from N-number of pattern images captured by a camera, and N is four).