Mask Error Enhancement Factor (meef) Aware Mask Rule Check (mrc)

1. A method, comprising: providing an integrated circuit (IC) layout, wherein the IC layout has a first feature and an adjacent second feature; determining a first mask error enhancement factor (MEEF) index associated with the first feature using an electronic processor; determining a second MEEF index associated with the second feature using an electronic processor; determining a space violation of a distance between the first feature and the second feature using an electronic processor; using the first MEEF index and the second MEEF index to remedy the space violation by modifying a location of at least an edge of the first feature, thereby increasing the distance between the first feature and the second feature; and fabricating a photomask, wherein the photomask has the modified location of the edge of the first feature.

2. The method of claim 1 , wherein determining the first MEEF index includes using a simulated contour for the first feature.

3. The method of claim 2 , wherein the first MEEF index is the simulated contour for the first feature divided by a critical dimension (CD) bias of the first feature.

4. The method of claim 1 , wherein the using the first MEEF index and the second MEEF index includes: using the first MEEF index and the second MEEF index to determine a pullback ratio for the first feature, and multiplying the space violation by the pullback ratio to determine the modified location of the edge of the first feature.

5. The method of claim 1 , wherein using the first MEEF index and the second MEEF index includes determining a ratio between the first MEEF index and the second MEEF index.

6. The method of claim 5 , further comprising: using the first MEEF index and the second MEEF index to determine a first pullback ratio for the first feature and a second pullback ratio for the second feature; multiplying the space violation by the first pullback ratio to determine the modified location of the edge of the first feature; and multiplying the space violation by the second pullback ratio to determine the modified location of an edge of the second feature.

7. The method of claim 6 , wherein the modified location of the edge of the first feature and the modified location of the edge of the second feature provide a modified spacing between the first and second features that passes a mask rule check.

8. The method of claim 1 , wherein the using the first MEEF index and the second MEEF index to remedy the space violation is performed during a mask rule check (MRC) process.

9. The method of claim 1 , further comprising: determining a corner space violation of a distance associated with the first feature; using the first MEEF index to remedy the corner space violation by modifying a location of a corner of the first feature; and wherein the fabricating the photomask includes fabricating the first feature with the modified location of the corner of the first feature.

10. A method of semiconductor device fabrication, comprising: providing a layout of an integrated circuit (IC) device, wherein the layout has a first feature and an adjacent second feature; using a data processor associated with a mask rule checking device to provide a modified layout, including to: determine a first mask error enhancement factor (MEEF) index associated with the first feature and a second MEEF index associated with the second feature; use the first MEEF index and the second MEEF index to determine a first pullback ratio associated with the first feature and a second pullback ratio associated with the second feature; determine a space violation between the first feature and the second feature, wherein the space violation is a length greater than a design rule of minimum spacing between the first and second features; multiply the length by the first pullback ratio to determine a pullback for an edge of the first feature; multiply the length by the second pullback ratio to determine a pullback for an edge of the second feature; and fabricating the IC device having the modified layout including the edge of the first feature defined by the pullback for the first feature and the edge of the second feature defined by the pullback for the second feature.

11. The method of claim 10 , wherein the data processor is further used to: determine a violation in a location of a corner of the first feature; determine a third MEEF index associated with a horizontal direction of the corner of the first feature; determine a fourth MEEF index associated with a horizontal direction of an adjacent corner of the second feature; modify the location of the corner of the first feature and the location of the corner of the second feature, wherein the location is determined using the third MEEF index and the fourth MEEF index; and wherein the fabricated IC device has the first feature and second feature having the modified location of the corners.

12. The method of claim 10 , wherein the data processor is further used to: determine a violation in a spacing between corners of the first and second features; determine a third MEEF index associated with a vertical direction of the corner of the first feature; determine a fourth MEEF index associated with a vertical direction of an adjacent corner of the second feature; modify the location of the corner of the first feature, wherein the location is determined using the third MEEF index; modify the location of the corner of the second feature, wherein the location is determined using the fourth MEEF index; and wherein the fabricated IC device has the first feature and second feature having the modified location of the corners.

13. The method of claim 10 , wherein the determining the first mask error enhancement factor (MEEF) index includes: determining a simulated contour critical dimension (CD) error of the first feature; determining a CD bias of an image of the first feature; and dividing the simulated contour CD error by the CD bias to provide the first MEEF index.

14. The method of claim 10 , wherein the fabricating the IC device includes: fabricating a phase shift mask having the edge of the first feature defined by the pullback for the first feature and the edge of the second feature defined by the pullback for the second feature.

15. The method of claim 10 , wherein the fabricating the IC device includes: converting the layout into fractured data suitable for reading by an electron beam writer tool, wherein the fractured data defines a phase the edge of the first feature defined by the pullback for the first feature and the edge of the second feature defined by the pullback for the second feature.

16. A non-transitory medium storing instructions for a mask rule check (MRC), wherein the MRC includes: instructions for computing a first mask error enhancement factor (MEEF) index associated with a first feature of a layout of a semiconductor device instructions for computing a second mask error enhancement factor (MEEF) index associated with a second feature of the layout of the semiconductor device, the second feature adjacent the first feature in the layout; instructions for computing a pullback ratio associated with the first feature of the layout using the MEEF index of the feature; receiving a design rule directed to a spacing between the first feature and the second feature; instructions for determining a violation of a disposition of the first feature in the layout with respect to the design rule; and instructions for modifying a placement of at least one edge of the first feature feature, wherein the modifying the placement is determined using the pullback ratio of the first feature and the determined violation.

17. The non-transitory medium of claim 16 , wherein the instructions for modifying the placement includes: determining a distance between the first feature and the second feature, wherein the distance is a length greater than the design rule spacing; and multiplying the pullback ratio by the length greater than the design rule spacing.

18. The non-transitory medium of claim 16 , wherein the instructions for computing the MEEF index includes: receiving a simulated contour critical dimension (CD) error for the first feature; receiving a CD bias of the first feature; and dividing the simulated contour CD error by the CD bias to determine the first MEEF index.

19. The non-transitory medium of claim 16 , wherein the instructions further includes checking a minimum line width of the first feature.

20. The non-transitory medium of claim 16 , wherein the instructions for determining the violation include verifying a spacing between the first feature and the second feature, wherein the spacing is associated with one of an edge and a corner.