Legal claims defining the scope of protection. Each claim is shown in both the original legal language and a plain English translation.
1. A method of forming a layout, the method comprising: developing a circuit schematic diagram, using a computer, the circuit schematic diagram including a plurality of cells; generating cell placement rules for the plurality of cells based on the circuit schematic diagram; developing a circuit layout diagram for the plurality of cells based on the cell placement rules; grouping the cells of the plurality of cells of the circuit layout diagram into groups of two or more cells having a same threshold voltage based on threshold voltages of the cells of the plurality of cells; identifying if any cells of the groups of cells violate a minimum area requirement; identifying if any open spaces between the cells violate the minimum area requirement; and inserting a threshold voltage compliant filler into the identified open spaces between the identified cells which violate the minimum area requirement of the circuit layout diagram.
A method for creating an integrated circuit layout using a computer. First, a circuit schematic is created that includes multiple cells. Next, cell placement rules are generated based on the schematic. Then, a circuit layout is developed, arranging the cells based on these rules. Cells are grouped based on having the same threshold voltage. Any cell groups or open spaces that don't meet minimum size requirements are identified. Finally, filler material, compatible with the surrounding threshold voltages, is inserted into these insufficient open spaces to satisfy the minimum area requirements of the circuit layout.
2. The method of claim 1 , wherein generating cell placement rules comprises: analyzing a cell width for the cells of the plurality of cells; grouping the plurality of cells based on cell size and circuit type; and defining minimum area requirements between cells of the plurality of cells based on cell size and threshold voltage.
In the method for creating an integrated circuit layout, the step of generating cell placement rules includes analyzing the width of each cell, grouping cells based on their size and the type of circuit they belong to, and defining the minimum area required between cells. This minimum area is determined by both the cell size and the threshold voltage of the cells. This ensures adequate spacing and proper electrical characteristics are maintained within the layout.
3. The method of claim 2 , wherein analyzing the cell width comprises comparing the cells of the plurality of cells to a minimum value.
In the method for creating an integrated circuit layout where cell placement rules are generated, analyzing the cell width involves comparing the width of each cell to a predefined minimum width value. If a cell's width is below this minimum, it is flagged as potentially needing additional spacing or filler during the layout process. This ensures that all cells meet the minimum size requirements for proper functionality.
4. The method of claim 1 , wherein inserting threshold voltage compliant fillers comprises: inserting at least one of a dummy cell, a replacement cell, a decoupling cell or an open area.
In the method for creating an integrated circuit layout, inserting threshold voltage compliant fillers into the circuit layout diagram can be done using various options including inserting a dummy cell (an inactive cell), a replacement cell (a cell with similar functionality), a decoupling cell (a cell to reduce noise), or simply leaving an open area filled with appropriate doping material to meet the required threshold voltage characteristics.
5. The method of claim 1 , wherein inserting the threshold voltage compliant filler comprises: increasing a width of the identified cells; increasing a width of at least one cell adjacent the identified open spaces; and filling remaining open spaces with at least one threshold voltage dopant.
In the method for creating an integrated circuit layout, inserting threshold voltage compliant filler into identified open spaces involves increasing the width of the identified cells that are too small. It also increases the width of adjacent cells next to these open spaces. Any remaining open spaces are then filled with a material (dopant) that matches the required threshold voltage. This combination of cell widening and filler ensures complete space utilization while maintaining correct voltage thresholds.
6. The method of claim 5 , wherein increasing the width of the identified cell comprises matching the threshold voltage of the threshold compliant filler to the threshold voltage of at least one of the adjacent cells of the plurality of cells.
In the method for creating an integrated circuit layout, when inserting threshold voltage compliant filler by increasing the width of a cell, the threshold voltage of the added filler material is matched to the threshold voltage of at least one of the adjacent cells. This ensures that the electrical characteristics of the area around the filled space remain consistent and that the filler doesn't negatively impact circuit performance due to voltage mismatches.
7. The method of claim 5 , wherein filling the remaining open spaces comprises filling the remaining open spaces with a single threshold voltage dopant.
In the method for creating an integrated circuit layout, when inserting threshold voltage compliant filler into the remaining open spaces, the spaces are filled with a material or dopant that provides a single, uniform threshold voltage. This simplifies the filling process and ensures consistent electrical behavior within the filled areas, avoiding potential complications from using multiple voltage levels.
8. The method of claim 1 , wherein developing the circuit layout diagram comprises converting the circuit schematic diagram using a cell library.
In the method for creating an integrated circuit layout, developing the circuit layout diagram involves converting the initial circuit schematic using a cell library. This cell library contains pre-designed layouts for standard circuit components (cells), which are then arranged and connected according to the schematic to create the physical layout of the integrated circuit.
9. A system for forming a layout, the system comprising: a memory configured to store data; and a processor connected to the memory, the processor configured to: develop a circuit schematic diagram including a plurality of cells; generate cell placement rules for the plurality of cells based on the circuit schematic diagram; develop a circuit layout diagram for the plurality of cells based on the cell placement rules; group the cells of the plurality of cells of the circuit layout diagram into groups of two or more cells having a same threshold voltage based on threshold voltages of the cells of the plurality of cells; identify if any cells of the groups of cells violate a minimum area requirement; identify if any open spaces between the cells violate the minimum area requirement; and insert threshold voltage compliant fillers into the identified open spaces between the identified cells which violate the minimum area requirement of the circuit layout diagram.
A system for creating an integrated circuit layout includes a memory to store data and a processor. The processor develops a circuit schematic with multiple cells. It then generates cell placement rules based on the schematic. The processor develops a circuit layout by arranging the cells. The cells are grouped by threshold voltage. The processor identifies cells or open spaces that violate minimum area requirements. Finally, the processor inserts threshold voltage compliant fillers into the identified open spaces between cells that don't meet the minimum area requirement.
10. The system of claim 9 , wherein the processor is further configured to: analyze a cell width and a threshold voltage for each of the plurality of cells; group the plurality of cells based on cell size and circuit type; and define a minimum area requirement between cells of the plurality of cells based on cell size and threshold voltage.
In the system for creating an integrated circuit layout, the processor analyzes the cell width and threshold voltage of each cell. It then groups the cells based on their size and circuit type. The processor defines a minimum area requirement between cells, taking into account both the cell size and its threshold voltage to optimize placement and performance.
11. The system of claim 10 , wherein the processor is configured to determine the cell size using a comparison between the cells of the plurality of cells and a minimum value.
In the system for creating an integrated circuit layout, the processor determines the cell size by comparing the dimensions of each cell to a predefined minimum value. This comparison allows the system to identify cells that are too small and require additional spacing or filler material during the layout process.
12. The system of claim 9 , wherein the processor is further configured to: increase a width of the identified cells; increase a width of at least one cell adjacent the identified open spaces; and fill remaining open spaces with at least one threshold voltage dopant.
In the system for creating an integrated circuit layout, the processor increases the width of cells that are too small and widens adjacent cells next to insufficient open spaces. The processor then fills any remaining open spaces with a material or dopant that provides the required threshold voltage, ensuring complete area coverage and correct electrical characteristics of the circuit.
13. The system of claim 12 , wherein the processor is configured to match the threshold voltage of the threshold compliant filler to the threshold voltage of at least one of the adjacent cells of the plurality of cells.
In the system for creating an integrated circuit layout, when inserting threshold voltage compliant filler by increasing the width of a cell, the processor matches the threshold voltage of the filler material to the threshold voltage of at least one of the adjacent cells. This ensures consistent electrical behavior and avoids voltage mismatches that could negatively affect circuit performance.
14. The system of claim 12 , wherein the processor is configured to fill the remaining open spaces with a single threshold voltage dopant.
In the system for creating an integrated circuit layout, the processor fills remaining open spaces with a material or dopant that provides a single, uniform threshold voltage. This simplifies the filling process and ensures consistent electrical behavior within the filled areas, avoiding potential complications arising from using multiple voltage levels in close proximity.
15. The system of claim 14 , wherein the processor is configured to convert the circuit schematic diagram to the circuit layout diagram using a cell library.
In the system for creating an integrated circuit layout, the processor converts the circuit schematic into the circuit layout diagram using a cell library containing pre-designed layouts for standard circuit components. These layouts are arranged and connected based on the schematic to create the physical implementation of the circuit.
16. A method of inserting a threshold voltage compliant filler into a circuit layout diagram, the method comprising: identifying, by a processor, a first small cell having a first width less than a minimum value, the first small cell having a first threshold voltage; identifying a second cell having a second threshold voltage different from the first threshold voltage, the second cell separated from the first small cell by a distance; identifying an open space between the first small cell and the second cell which violates a defined minimum area requirement; increasing a width of at least one of the first small cell or the second cell adjacent the identified open space by filling at least some of the identified open space with at least one filler disposed between the first small cell and the second cell, the at least one filler having the first threshold voltage or the second threshold voltage.
A method for adding threshold voltage compliant filler to a circuit layout, using a processor: identifies a small cell (first cell) that's narrower than a minimum width and has a specific threshold voltage (first). Identifies another cell (second cell) separated from the first, with a different threshold voltage. If the gap between them is too small, based on a minimum area rule, it increases the width of either the first cell or second cell (or both). Filler material having either the first cell's threshold voltage or the second cell's is added in the gap, expanding the cell(s) to meet layout rules.
17. The method of claim 16 , wherein the second cell is a second small cell having a second width less than the minimum value, the distance is equal to or greater than twice the minimum value minus the first width and the second width, and filling at least some of the identified open space comprises: filling an identified opening adjacent to the first small cell with a first filler, the first filler having the first threshold voltage, and a total width of the first filler and the first width is greater than or equal to the minimum value; and filling another identified opening adjacent to the second small cell with a second filler, the second filler having the second threshold voltage, and a total width of the second filler and the second width is greater than or equal to the minimum value.
In the method for inserting threshold voltage compliant filler into a circuit layout, if the second cell is also a small cell with a width less than the minimum value, and the distance between the two small cells is large (exceeding twice the minimum value minus the sum of both cell widths), then filling the space involves adding filler to *both* cells. A first filler, matching the first cell's threshold voltage, is added to the first cell's side until the first cell plus filler meets the minimum width. A second filler, matching the second cell's threshold voltage, is added to the second cell's side until the second cell plus filler meets the minimum width.
18. The method of claim 16 , wherein the second cell is a large cell having a second width greater than or equal to the minimum value, and filling at least some of the identified open space comprises: filling an identified opening adjacent to the first small cell with a first filler, the first filler having the first threshold voltage, and a total width of the first filler and the first width is greater than or equal to the minimum value.
In the method for inserting threshold voltage compliant filler into a circuit layout, if the second cell is a large cell (width greater or equal to the minimum), filler is added only to the small cell (first cell). A filler with the same threshold voltage as the small cell is placed next to it, increasing the small cell's width until the small cell plus the filler meets the minimum width requirement. The large cell's dimensions remain unchanged.
19. The method of claim 16 , further comprising: identifying a first large cell having a second width greater than or equal to a minimum value, the first large cell having the first threshold voltage and being separated from the first small cell by a distance between the first large cell and the first small cell that is less than the minimum value.
In the method for inserting threshold voltage compliant filler into a circuit layout, the method can also identify a large cell, having the same threshold voltage as the first small cell, which is positioned closer to the first small cell than the minimum allowed distance. This identifies areas where cells of the same threshold voltage are too close together, which can be addressed by adjusting their positions or adding filler appropriately.
20. The method of claim 16 , wherein the at least one filler comprises at least one of a dummy cell, a replacement cell, a decoupling cell or an open area.
In the method for inserting threshold voltage compliant filler into a circuit layout, the filler material can be a variety of options, including a dummy cell (inactive), a replacement cell, a decoupling cell (for noise reduction), or simply an open area filled with doping material to meet the required threshold voltage characteristics. The selection of the appropriate filler depends on the specific design requirements and optimization goals.
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September 2, 2014
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