Apparatus and Method for Inspecting Crystallization

1. An apparatus for inspecting crystallization, the apparatus comprising: a stage configured to change a position of a substrate, the substrate being seated thereon and comprising a semiconductor layer, the semiconductor layer comprising a plurality of crystallized regions separated from each other; a camera configured to acquire image data regarding the semiconductor layer; a visual inspection unit configured to obtain inspection data regarding at least one of the plurality of crystallized regions of the semiconductor layer; and a controller configured to output change data regarding a change in the position of the substrate according to the brightness data in the image data acquired by the camera, such that the visual inspection unit can obtain the inspection data regarding the at least one of the plurality of crystallized separate regions, wherein the controller is further configured to determine that one of the plurality of crystallized separate regions is a portion of the semiconductor layer having a brightness in a second brightness range and located between other portions of the semiconductor layer having brightnesses in a first brightness range, and wherein the second brightness range comprises values that are greater than those of the first brightness range.

2. An apparatus of for inspecting crystallization, the apparatus comprising: a stage configured to change a position of a substrate, the substrate being seated thereon and comprising a semiconductor layer, the semiconductor layer comprising a plurality of crystallized regions separated from each other; a camera configured to acquire image data regarding the semiconductor layer; a visual inspection unit configured to obtain inspection data regarding at least one of the plurality of crystallized regions of the semiconductor layer; and a controller configured to output change data regarding a change in the position of the substrate according to brightness data in the image data acquired by the camera, such that the visual inspection unit can obtain the inspection date regarding the at least one of the plurality of crystallized separate regions, wherein the controller is further configured to determine that one of the plurality of crystallized separate regions is a portion of the semiconductor layer having a brightness between peak brightnesses and in a present brightness range.

3. The apparatus of claim 1 , wherein a position of the camera is fixed relative to a position of the visual inspection unit.

4. An apparatus for inspecting crystallization, the apparatus comprising: a substrate seating portion on which a substrate is seated, the substrate comprising a semiconductor layer, the semiconductor layer comprising a plurality of crystallized regions separated from each other; a camera configured to acquire image data regarding the semiconductor layer; a visual inspection unit configured to acquire inspection data regarding at least one of the plurality of crystallized regions of the semiconductor layer, the camera and the visual inspection unit each being configured to change position with respect to the substrate seating portion; and a controller configured to output change data regarding a change in the positions of the camera and the visual inspection unit according to brightness data in the image data acquired by the camera, such that the visual inspection unit can obtain inspection data regarding the at least one of the plurality of crystallized separate regions, wherein the controller is further configured to determine that one of the plurality of crystallized separate regions is a portion of the semiconductor layer having a brightness in a second brightness range and located between other portions of the semiconductor layer having brightnesses in a first brightness range, and wherein the second brightness range comprises values that are greater than those of the first brightness range.

5. An apparatus of for inspecting crystallization, the apparatus comprising: a substrate seating portion on which a substrate is seated, the substrate comprising a semiconductor layer, the semiconductor layer comprising a plurality of crystallized regions separated from each other; a camera configured to acquire image data regarding the semiconductor layer; a visual inspection unit configured to acquire inspection data regarding at least one of the plurality of crystallized regions of the semiconductor layer, the camera and the visual inspection unit each being configured to change position with respect to the substrate seating portions; and a controller configured to output change data regarding a change in the position of the camera and the visual inspection unit according to brightness data in the image data acquired by the camera, such that the visual inspection unit can obtain inspection data regarding the at least one of the plurality of crystallized separate regions, wherein the controller is further configured to determine that one of the plurality of crystallized separate regions is a portion of the semiconductor layer having a brightness between peak brightnesses and in a present brightness range.

6. The apparatus of claim 4 , wherein a position of the camera is fixed relative to a position of the visual inspection unit.

7. A method of fabricating a display, the method comprising: preparing a substrate comprising a semiconductor layer comprising a plurality of crystallized regions separated from each other; changing at least one position of the substrate or a visual inspection unit according to image data acquired regarding the semiconductor layer to obtain inspection data regarding at least one of the plurality of crystallized separate regions; obtaining the inspection data regarding the at least one of the plurality of crystallized separate regions; changing the at least one position of the substrate or the visual inspection unit according to the image data acquired regarding the semiconductor layer to obtain inspection data regarding another one of the plurality of crystallized separate regions; and obtaining the inspection data regarding the another one of the plurality of crystallized separate regions, wherein the at least one position of the substrate or the visual inspection unit is changed according to brightness data in the acquired image data, wherein the at least one position of the substrate or the visual inspection unit is changed by determining that one of the plurality of crystallized separate regions is a portion of the semiconductor layer having a brightness in a second brightness range and located between other portions of the semiconductor layer having brightnesses in a first brightness range, and wherein the second brightness range comprises values that are greater than those of the first brightness range.

8. A method of fabricating a display, the method comprising: preparing a substrate comprising a semiconductor layer comprising a plurality of crystallized regions separated from each other; changing at least one position of the substrate or a visual inspection unit according to image data acquired regarding the semiconductor layer to obtain inspection data regarding at least one of the plurality of crystallized separate regions; obtaining the inspection data regarding the at least one of the plurality of crystallized separate region; changing the at least one position of the substrate or the visual inspection unit according to the image data acquired regarding the semiconductor layer to obtain inspection data regarding another one of the plurality of crystallized separate regions; and obtaining the inspection data regarding the another one of the plurality of crystallized separate regions, wherein the at least one position of the substrate or the visual inspection unit is changed according to the brightness data in the acquired image data, and wherein the at least one position of the substrate or the visual inspection unit is changed by determining that one of the plurality of crystallized separate regions is a portion of the semiconductor layer having a brightness between peak brightnesses and in a brightness range.

9. The method of claim 7 , wherein the changing of the at least one position of the substrate or the visual inspection unit to obtain inspection data regarding the another one of the plurality of crystallized separate regions and the obtaining of the inspection data regarding the another one of the plurality of crystallized separate regions are repeated.