Nano-Stamp and Matched Reader for Anti-Counterfeiting Applications

1. A method for validating a security seal having sub-100 nm features on the surface thereof with a chosen period, and a selected direction on the surface, comprising: directing a laser beam having a single selected wavelength longer than the chosen period onto a region of the surface at a chosen angle of incidence, and a chosen azimuthal angle relative to the selected direction on the surface; receiving far-field light produced by the sub-100 nm features of the surface on a detector disposed at a selected distance from the region of the surface; and validating the security seal.

2. The method of claim 1 , further comprising the step of focusing the laser beam onto the region of the surface using focusing optics disposed at a chosen location along the laser beam.

3. The method of claim 1 , further comprising the step of comparing the received light with a reference light pattern acquired by illuminating a region of a valid security seal having a known periodic surface, using laser beam light having the single selected-wavelength, the chosen angle of incidence to the known surface, the chosen azimuthal angle relative to the selected direction on the known surface, and received on the detector disposed at the selected distance from the region of the known surface.

4. The method of claim 3 , further comprising the step of generating an alarm when the received light from the security seal and the received light from the known valid security seal differ by selected criteria.

5. The method of claim 1 , wherein the surface is buried under a layer of material transparent to the laser light.

6. The method of claim 1 , wherein the chosen period is greater than 0 nm and less than 200 nm.

7. The method of claim 1 , wherein the single laser wavelength is chosen from the near infrared, visible and ultraviolet region of the electromagnetic spectrum.

8. The method of claim 1 , wherein the periodic sub-100 nm features further comprise an identity tag.

9. The method of claim 1 , wherein the sub-100 nm features are generated using extreme ultraviolet light or vacuum ultraviolet light.

10. The method of claim 9 , wherein the extreme ultraviolet light is produced using a capillary discharge extreme ultraviolet laser.

11. The method of claim 9 , wherein the sub-100 nm features are generated using Talbot mask imaging.

12. The method of claim 1 , wherein the sub-100 nm features comprise an absorption pattern or a phase pattern, or a combination of an absorption pattern and a phase pattern.

13. A method for validating a security seal having sub-100 nm features on the surface thereof with a chosen period, and a selected direction on the surface, comprising: directing a laser beam having a single selected wavelength longer than the chosen period onto a region of the surface at a chosen angle of incidence, and a chosen azimuthal angle relative to the selected direction on the surface; focusing the laser beam onto the region of the surface using focusing optics disposed at a chosen location along the laser beam; receiving far-field light produced by the sub-100 nm features on the surface on a detector disposed a selected distance from the region of the surface; and validating the security seal.

14. A system for validating a security seal, comprising: a security seal having sub-100 nm features on the surface thereof with a chosen period, and a selected direction on the surface; a laser configured to generate a single selected wavelength longer than the chosen period for generating a beam of light directed onto a region of the surface of said seal at a chosen angle of incidence relative to the normal of the surface, and a chosen azimuthal angle relative to the selected direction on the surface; and a detector configured to receive far-field light produced by the sub-100 nm features of the surface disposed at a selected distance from the region of the surface and validate the security seal.

15. The apparatus of claim 14 , further comprising focusing optics disposed at a chosen location along the laser beam for focusing the laser beam onto the region of the first surface.

16. The apparatus of claim 14 , further comprising a valid security seal having a known periodic sub-100 nm features on the surface thereof, for comparing the light received on said detector with a reference light pattern acquired by illuminating a region of using a beam of laser light having the single elected wavelength, the chosen angle of incidence on the known surface, the chosen azimuthal angle relative to the selected direction on the known surface, and received on said detector disposed at the selected distance from the region of the known surface.

17. The apparatus of claim 14 , wherein the surface of said security seal is buried under a layer of material transparent to the laser light.

18. The apparatus of claim 14 , wherein the chosen period is greater than 0 nm and less than 200 nm.

19. The apparatus of claim 14 , wherein the laser wavelength is chosen from the near infrared, visible and ultraviolet region of the electromagnetic spectrum.

20. The apparatus of claim 14 , wherein the sub-100 nm features further comprise an identity tag.

21. The apparatus of claim 14 , wherein the sub-100 nm features are generated using extreme ultraviolet light or vacuum ultraviolet light.

22. The apparatus of claim 21 , wherein the extreme ultraviolet light is produced using a capillary discharge extreme ultraviolet laser.

23. The apparatus of claim 21 , wherein the sub-100 nm features are generated using Talbot mask imaging.

24. The apparatus of claim 14 , wherein the sub-100 nm features comprise an absorption pattern or a phase pattern, or a combination of an absorption pattern and a phase pattern.