Patentable/Patents/US-10274425
US-10274425

Structured illumination for contrast enhancement in overlay metrology

PublishedApril 30, 2019
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.

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Patent Metadata

Filing Date

May 8, 2017

Publication Date

April 30, 2019

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Cite as: Patentable. “Structured illumination for contrast enhancement in overlay metrology” (US-10274425). https://patentable.app/patents/US-10274425

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