Patentable/Patents/US-10505025
US-10505025

Tunnel field-effect transistor and method for forming the same

PublishedDecember 10, 2019
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A device includes a first semiconductor layer, a second semiconductor layer, and an intrinsic semiconductor layer. The second semiconductor layer is over the first semiconductor layer. The first semiconductor layer and the second semiconductor layer are of opposite conductivity types. The second semiconductor layer includes a first sidewall and a second sidewall substantially perpendicular to and larger than the first sidewall. The intrinsic semiconductor layer is in contact with the second sidewall of the second semiconductor layer and the first semiconductor layer.

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Patent Metadata

Filing Date

August 2, 2018

Publication Date

December 10, 2019

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Tunnel field-effect transistor and method for forming the same