Patentable/Patents/US-10578980
US-10578980

Method of determining a position of a feature

PublishedMarch 3, 2020
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.

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Patent Metadata

Filing Date

November 23, 2017

Publication Date

March 3, 2020

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