Patentable/Patents/US-10580678
US-10580678

Apparatus and method for semiconductor wafer leveling, force balancing and contact sensing

PublishedMarch 3, 2020
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A wafer bonder apparatus, includes a lower chuck, an upper chuck, a process chamber and three adjustment mechanisms. The three adjustment mechanisms are arranged around a top lid spaced apart from each other and are located outside of the process chamber. Each adjustment mechanism includes a component for sensing contact to the upper chuck, a component for adjusting the pre-load force of the upper chuck, and a component for leveling the upper chuck.

Patent Claims
3 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A method for wafer bonding, the method comprising: providing a lower chuck configured to support a first wafer; providing an upper chuck configured to support a second wafer, wherein the second wafer is arranged opposite to the first wafer; providing a process chamber formed between the upper chuck and the lower chuck; and providing three adjustment mechanisms arranged around a top lid at an angle of 120 degrees from each other and being located outside of the process chamber, wherein each adjustment mechanism comprises a component for sensing contact to the upper chuck, a component for adjusting the pre-load force of the upper chuck, and a component for leveling the upper chuck, wherein the three adjustment mechanisms are accessible from outside of the process chamber, and wherein the components for adjusting the pre-load force of the upper chuck are operable from the top.

2

2. A method for wafer bonding, the method comprising: providing a lower chuck configured to support a first wafer; providing an upper chuck configured to support a second wafer, wherein the second wafer is arranged opposite to the first wafer; providing a process chamber formed between the upper chuck and the lower chuck; providing three adjustment mechanisms arranged around a top lid at an angle of 120 degrees from each other and being located outside of the process chamber, wherein each adjustment mechanism comprises a component for sensing contact to the upper chuck, a component for adjusting the pre-load force of the upper chuck, and a component for leveling the upper chuck; and adjusting manually the pre-load force and the leveling of the upper chuck and guiding contact to the upper chuck via a computer application.

3

3. The method of claim 2 , wherein the computer application is configured to provide images and positions of the three adjustment mechanisms on a display, and to control and guide motion of the upper chuck via the component for sensing contact, and wherein when contact to the upper chuck is detected the images of the adjustment mechanisms where contact occurred light up.

Classification Codes (CPC)

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Patent Metadata

Filing Date

November 2, 2017

Publication Date

March 3, 2020

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Cite as: Patentable. “Apparatus and method for semiconductor wafer leveling, force balancing and contact sensing” (US-10580678). https://patentable.app/patents/US-10580678

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