Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. In one embodiment, a major axis of the processing volume is oriented vertically and a minor axis of the processing volume is oriented horizontally. One or more electrodes may be disposed adjacent the processing volume and at least partially define the processing volume. Process fluid is provided to the processing volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A plurality of seals maintains the fluid containment integrity of the processing volume during processing. A post process chamber for rinsing, developing, and drying a substrate is also provided.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A substrate processing apparatus, comprising: a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally; a moveable door coupled to the chamber body, the door rotatable about an axis; a first electrode coupled to the door and a seal coupled to the first electrode, wherein the seal is configured to contact a backside of a substrate when a frontside of the substrate is disposed adjacent to the process volume; a backing plate disposed between the first electrode and the door; a first plurality of fluid ports formed in a sidewall of the chamber body adjacent the process volume; and a second plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume opposite the first plurality of fluid ports.
2. The apparatus of claim 1 , further comprising: a process fluid source in fluid communication with the process volume via a first plurality of channels and the first plurality of fluid ports.
3. The apparatus of claim 2 , further comprising: a fluid outlet in fluid communication with the process volume via a second plurality of channels and the second plurality of fluid ports.
4. The apparatus of claim 2 , wherein 21 channels of the first plurality of channels are formed in the chamber body.
5. The apparatus of claim 3 , wherein 21 channels of the second plurality of channels are formed in the chamber body.
6. The apparatus of claim 1 , wherein the first electrode is configured to vacuum chuck the substrate thereon.
7. The apparatus of claim 6 , wherein a vacuum source is in fluid communication with the first electrode.
8. The apparatus of claim 1 , wherein the chamber body is formed from polytetrafluoroethylene.
9. The apparatus of claim 1 , wherein the first plurality of fluid ports are distributed evenly across a diameter of the process volume.
10. The apparatus of claim 9 , wherein a diameter of each of the ports of the first plurality of fluid ports is between about 3.0 mm and about 3.5 mm.
11. The apparatus of claim 9 , wherein the second plurality of fluid ports are distributed evenly across the diameter of the process volume.
12. The apparatus of claim 11 , wherein a diameter of each of the ports of the second plurality of fluid ports is between about 3.0 mm and about 3.5 mm.
13. The apparatus of claim 1 , wherein a width of the process volume is between about 4.0 mm and about 4.5 mm.
14. The apparatus of claim 1 , wherein the seal is positioned on the first electrode adjacent to a region corresponding to an outer diameter of the substrate.
15. The apparatus of claim 1 , further comprising: a second seal coupled to the first electrode adjacent an outer diameter of the first electrode, wherein the second seal contacts a surface of a sidewall of the chamber body.
16. The apparatus of claim 1 , further comprising: a third seal coupled to an outer diameter of a second electrode, wherein the third seal is positioned in contact with a sidewall of the chamber body.
17. A substrate processing apparatus, comprising: a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally; a moveable door coupled to the chamber body, the door rotatable about an axis; a first electrode coupled to the door, the first electrode configured to contact a backside of a substrate and vacuum chuck the substrate thereon; a backing plate disposed between the first electrode and the door; a second electrode coupled to the chamber body, the second electrode at least partially defining the process volume; a seal coupled to an outer diameter of the second electrode, wherein the seal is positioned in contact with a sidewall of the chamber body; a first plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume; and a second plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume opposite the first plurality of fluid ports.
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December 15, 2017
August 25, 2020
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