Cleaning compositions

1. A cleaning composition, comprising: a) at least one fluoride containing compound; b) at least one tetrazole; c) at least one triazine in an amount of from about 0.02 wt % to about 0.1 wt % of the composition; d) at least one organic solvent; and e) water.

2. The composition of claim 1 , wherein the at least one tetrazole comprises a substituted or unsubstituted tetrazole.

3. The composition of claim 1 , wherein the at least one tetrazole comprises a tetrazole optionally substituted by at least one substituent selected from the group consisting of COOR 1 and N(R 1 R 2 ), in which each of R 1 and R 2 , independently, is H or C 1 -C 6 alkyl.

4. The composition of claim 1 , wherein the at least one tetrazole comprises 1H-tetrazole, 1H-tetrazole-5-carboxylic acid, 5-phenyltetrazole, or 5-amino-1H-tetrazole.

5. The composition of claim 1 , wherein the at least one tetrazole is in an amount of from about 0.01 wt % to about 1.5 wt % of the composition.

6. The composition of claim 1 , wherein the at least one triazine comprises a substituted or unsubstituted triazine.

7. The composition of claim 1 , wherein the at least one triazine comprises a triazine optionally substituted by at least one substituent selected from the group consisting of aryl and N(R 3 R 4 ), in which each of R 3 and R 4 , independently, is H or C 1 -C 6 alkyl.

8. The composition of claim 1 , wherein the at least one triazine comprises benzoguanamine.

9. The composition of claim 1 , wherein the at least one triazine is in an amount of from about 0.02 wt % to about 0.09 wt % of the composition.

10. The composition of claim 1 , wherein the at least one fluoride containing compound selected from the group consisting of HF, H 2 SiF 6 , H 2 PF 6 , HBF 4 , NH 4 F, and tetraalkylammonium fluoride.

11. The composition of claim 1 , wherein the at least one fluoride containing compound is in an amount of from about 0.05 wt % to about 1.5 wt % of the composition.

12. The composition of claim 1 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of alcohols, ketones, ethers, and esters.

13. The composition of claim 1 , wherein the at least one organic solvent comprises a solvent selected form the group consisting of alcohols.

14. The composition of claim 13 , wherein the alcohols are alkane diols.

15. The composition of claim 14 , wherein the alkane diols are glycols.

16. The composition of claim 15 , wherein the glycols are selected from the group consisting of ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, and tetraethylene glycol.

17. The composition of claim 1 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of ethers.

18. The composition of claim 17 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of glycol ethers.

19. The composition of claim 18 , wherein the glycol ethers are selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-propyl ether, ethylene glycol monoisopropyl ether, ethylene glycol mono n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monobutyl ether, 1-methoxy-2-propanol, 2-methoxy-1-propanol, 1-ethoxy-2-propanol, 2-ethoxy-1-propanol, propylene glycol mono-n-propyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, dipropylene glycol mono-n-propyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monomethyl ether, ethylene glycol monobenzyl ether, and diethylene glycol monobenzyl ether.

20. The composition of claim 1 , comprising at least two organic solvents.

21. The composition of claim 1 , wherein the at least one organic solvent is in an amount of at least about 90 wt % of the composition.

22. The composition of claim 1 , wherein the water is in an amount of from about 0.1 wt % to about 2 wt % of the composition.

23. A cleaning composition, comprising: a) at least one fluoride containing compound; b) at least one tetrazole; c) at least one triazine; d) at least one organic solvent; e) water; and f) at least one aromatic anhydride.

24. The composition of claim 23 , wherein the aromatic anhydride comprises a benzoic anhydride, a phthalic anhydride, or 2-sulfobenzoic anhydride.

25. The composition of claim 23 , wherein the at least one aromatic anhydride is in an amount of from about 0.01% to about 0.5% by weight of the composition.

26. The composition of claim 1 , further comprising at least one triazole.

27. The composition of claim 26 , wherein the at least one triazole comprises a substituted or unsubstituted triazole.

28. The composition of claim 27 , wherein the at least one triazole comprises a triazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

29. The composition of claim 28 , wherein the at least one triazole comprises 1,2,3-triazole, 1,2,4-triazole, 3-amino-1,2,4-triazole, 3-amino-5-mercapto-1,2,4-triazole, or 3,5-diamino-1,2,4-triazole.

30. The composition of claim 26 , wherein the at least one triazole comprises a substituted or unsubstituted benzotriazole.

31. The composition of claim 30 , wherein the at least one triazole comprises a benzotriazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

32. The composition of claim 31 , wherein the at least one triazole comprises benzotriazole, 5-aminobenzotriazole, 1-hydroxybenzotriazole, 5-phenylthiol-benzotriazole, 5-chlorobenzotriazole, 4-chlorobenzotriazole, 5-bromobenzotriazole, 4-bromobenzotriazole, 5-fluorobenzotriazole, 4-fluorobenzotriazole, naphthotriazole, tolyltriazole, 5-phenyl-benzotriazole, 5-nitrobenzotriazole, 4-nitrobenzotriazole, 2-(5-amino-pentyl)-benzotriazole, 1-amino-benzotriazole, 5-methyl-1H-benzotriazole, benzotriazole-5-carboxylic acid, 4-methylbenzotriazole, 4-ethylbenzotriazole, 5-ethylbenzotriazole, 4-propylbenzotriazole, 5-propylbenzotriazole, 4-isopropylbenzotriazole, 5-isopropylbenzotriazole, 4-n-butylbenzotriazole, 5-n-butylbenzotriazole, 4-isobutylbenzotriazole, 5-isobutylbenzotriazole, 4-pentylbenzotriazole, 5-pentylbenzotriazole, 4-hexylbenzotriazole, 5-hexylbenzotriazole, 5-methoxybenzotriazole, 5-hydroxybenzotriazole, dihydroxypropylbenzotriazole, 1-[N,N-bis(2-ethylhexyl)aminomethyl]-benzotriazole, 5-t-butyl benzotriazole, 5-(1′,1′-diimethylpropyl)-benzotriazole, 5-(1′,1′,3′-trimethylbutyl)benzotriazole, 5-n-octyl benzotriazole, or 5-(1′,1′,3′,3′-tetramethylbutyl)benzotriazole.

33. The composition of claim 26 , wherein the at least one triazole is in an amount of from about 0.05% to about 1% by weight of the composition.

34. The composition of claim 1 , further comprising at least one acid.

35. The composition of claim 34 , wherein the at least one acid comprises polyaminocarboxylic acid, polyaminophosphoric acid, p-toluenesulfonic acid, benzoic acid, ethanesulfonic acid, phosphoric acid, 1-hydroxyethyl-1,1-diphosphoric acid, sulfuric acid, or sulfonic acid.

36. The composition of claim 34 , wherein the at least one acid is in an amount of from about 0.01% to about 3% by weight of the composition.

37. The composition of claim 1 , further comprising at least one diazole.

38. The composition of claim 37 , wherein the at least one diazole comprises a substituted or unsubstituted imidazole, or a substituted or unsubstituted pyrazole.

39. The composition of claim 37 , wherein the at least one diazole comprises 1-methylimidazole, 2-phenylimidazole, 2-methylbenzoimidazole, 2-ethyl-4-methylimidazole, pyrazole, 3,5-dimethylpyrazole, or 3-aminopyrazole.

40. The composition of claim 37 , wherein the at least one diazole is in an amount of from about 0.1% to about 2% by weight of the composition.

41. A cleaning composition, comprising: a) at least one fluoride containing compound; b) at least one tetrazole in an amount of from about 0.05 wt % to about 0.8 wt % of the composition; c) at least one organic solvent; and d) water; wherein the composition does not include a sulfobenzoic anhydride.

42. A cleaning composition, comprising: a) at least one fluoride containing compound; b) at least one tetrazole selected from the group consisting of 1H-tetrazole and 1H-tetrazole-5-carboxylic acid; c) at least one organic solvent; d) at least one aromatic anhydride; and f) water.

43. A cleaning composition, comprising: a) at least one fluoride containing compound, provided that the at least one fluoride containing compound does not include HF; b) at least one tetrazole; c) at least one organic solvent; d) at least one aromatic anhydride; and f) water.

44. The composition of claim 43 , wherein the at least one fluoride containing compound is selected from the group consisting of H 2 SiF 6 , H 2 PF 6 , HBF 4 , NH 4 F, and tetraalkylammonium fluoride.

45. A cleaning composition, comprising: a) at least one fluoride containing compound; b) at least one first azole compound, in which the first azole compound is a diazole; c) at least one second azole compound, in which the second azole compound is different from the first azole compound and is selected from the group consisting of diazoles, triazoles, and tetrazoles; d) at least one organic solvent; and e) water.

46. The composition of claim 45 , wherein the at least one first azole compound comprises an imidazole or a pyrazole.

47. The composition of claim 45 , wherein the at least one first azole compound comprises 1-methylimidazole, 2-phenylimidazole, 2-methylbenzoimidazole, 2-ethyl-4-methylimidazole, pyrazole, 3,5-dimethylpyrazole, or 3-aminopyrazole.

48. The composition of claim 45 , wherein the at least one first azole compound is in an amount of from about 0.1% to about 2% by weight of the composition.

49. The composition of claim 45 , wherein the at least one second azole compound comprises a diazole.

50. The composition of claim 45 , wherein the at least one second azole compound comprises a triazole.

51. The composition of claim 50 , wherein the at least one second azole compound comprises a substituted or unsubstituted triazole.

52. The composition of claim 51 , wherein the at least one second azole compound comprises a triazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

53. The composition of claim 52 , wherein the at least one second azole compound comprises 1,2,3-triazole, 1,2,4-triazole, 3-amino-1,2,4-triazole, 3-amino-5-mercapto-1,2,4-triazole, or 3,5-diamino-1,2,4-triazole.

54. The composition of claim 50 , wherein the at least one second azole compound comprises a substituted or unsubstituted benzotriazole.

55. The composition of claim 54 , wherein the at least one second azole compound comprises a benzotriazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

56. The composition of claim 55 , wherein the at least one second azole compound comprises benzotriazole, 5-aminobenzotriazole, 1-hydroxybenzotriazole, 5-phenylthiol-benzotriazole, 5-chlorobenzotriazole, 4-chlorobenzotriazole, 5-bromobenzotriazole, 4-bromobenzotriazole, 5-fluorobenzotriazole, 4-fluorobenzotriazole, naphthotriazole, tolyltriazole, 5-phenyl-benzotriazole, 5-nitrobenzotriazole, 4-nitrobenzotriazole, 2-(5-amino-pentyl)-benzotriazole, 1-amino-benzotriazole, 5-methyl-1H-benzotriazole, benzotriazole-5-carboxylic acid, 4-methylbenzotriazole, 4-ethylbenzotriazole, 5-ethylbenzotriazole, 4-propylbenzotriazole, 5-propylbenzotriazole, 4-isopropylbenzotriazole, 5-isopropylbenzotriazole, 4-n-butylbenzotriazole, 5-n-butylbenzotriazole, 4-isobutylbenzotriazole, 5-isobutylbenzotriazole, 4-pentylbenzotriazole, 5-pentylbenzotriazole, 4-hexylbenzotriazole, 5-hexylbenzotriazole, 5-methoxybenzotriazole, 5-hydroxybenzotriazole, dihydroxypropylbenzotriazole, 1-[N,N-bis(2-ethylhexyl)aminomethyl]-benzotriazole, 5-t-butyl benzotriazole, 5-(1′,1′-diimethylpropyl)-benzotriazole, 5-(1′,1′,3′-trimethylbutyl)benzotriazole, 5-n-octyl benzotriazole, or 5-(1′,1′,3′,3′-tetramethylbutyl)benzotriazole.

57. The composition of claim 45 , wherein the at least one second azole compound comprises a tetrazole.

58. The composition of claim 57 , wherein the at least one second azole compound comprises a substituted or unsubstituted tetrazole.

59. The composition of claim 57 , wherein the at least one second azole compound comprises a tetrazole optionally substituted by at least one substituent selected from the group consisting of COOR 1 and N(R 1 R 2 ), in which each of R 1 and R 2 , independently, is H or C 1 -C 6 alkyl.

60. The composition of claim 57 , wherein the at least one second azole compound comprises 1H-tetrazole, 1H-tetrazole-5-carboxylic acid, 5-phenyltetrazole, or 5-amino-1H-tetrazole.

61. The composition of claim 57 , wherein the at least one second azole compound is in an amount of from about 0.1 wt % to about 2 wt % of the composition.

62. The composition of claim 45 , wherein the at least one fluoride containing compound selected from the group consisting of HF, H 2 SiF 6 , H 2 PF 6 , HBF 4 , NH 4 F, and tetraalkylammonium fluoride.

63. The composition of claim 45 , wherein the at least one fluoride containing compound is in an amount of from about 0.05 wt % to about 1.5 wt % of the composition.

64. The composition of claim 45 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of alcohols, ketones, ethers, and esters.

65. The composition of claim 45 , wherein the at least one organic solvent comprises a solvent selected form the group consisting of alcohols.

66. The composition of claim 65 , wherein the alcohols are alkane diols.

67. The composition of claim 66 , wherein the alkane diols are glycols.

68. The composition of claim 67 , wherein the glycols are selected from the group consisting of ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, and tetraethylene glycol.

69. The composition of claim 45 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of ethers.

70. The composition of claim 69 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of glycol ethers.

71. The composition of claim 70 , wherein the glycol ethers are selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-propyl ether, ethylene glycol monoisopropyl ether, ethylene glycol mono n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monobutyl ether, 1-methoxy-2-propanol, 2-methoxy-1-propanol, 1-ethoxy-2-propanol, 2-ethoxy-1-propanol, propylene glycol mono-n-propyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, dipropylene glycol mono-n-propyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monomethyl ether, ethylene glycol monobenzyl ether, and diethylene glycol monobenzyl ether.

72. The composition of claim 45 , comprising at least two organic solvents.

73. The composition of claim 45 , wherein the at least one organic solvent is in an amount of at least about 90 wt % of the composition.

74. The composition of claim 45 , wherein the water is in an amount of from about 0.1 wt % to about 2 wt % of the composition.

75. The composition of claim 45 , further comprising at least one triazine.

76. The composition of claim 75 , wherein the at least one triazine comprises a substituted or unsubstituted triazine.

77. The composition of claim 75 , wherein the at least one triazine comprises a triazine optionally substituted by at least one substituent selected from the group consisting of aryl and N(R 3 R 4 ), in which each of R 3 and R 4 , independently, is H or C 1 -C 6 alkyl.

78. The composition of claim 75 , wherein the at least one triazine comprises benzoguanamine.

79. The composition of claim 75 , wherein the at least one triazine is in an amount of from about 0.01 wt % to about 0.1 wt % of the composition.

80. The composition of claim 45 , further comprising at least one aromatic anhydride.

81. The composition of claim 80 , wherein the aromatic anhydride comprises a benzoic anhydride, a phthalic anhydride, or 2-sulfobenzoic anhydride.

82. The composition of claim 80 , wherein the at least one aromatic anhydride is in an amount of from about 0.01% to about 0.5% by weight of the composition.

83. The composition of claim 45 , further comprising at least one acid.

84. The composition of claim 83 , wherein the at least one acid comprises polyaminocarboxylic acid, polyaminophosphoric acid, p-toluenesulfonic acid, benzoic acid, ethanesulfonic acid, phosphoric acid, 1-hydroxyethyl-1,1-diphosphoric acid, sulfuric acid, or sulfonic acid.

85. The composition of claim 83 , wherein the at least one acid is in an amount of from about 0.01% to about 3% by weight of the composition.

86. A method for cleaning a semiconductor substrate, comprising: contacting the semiconductor substrate containing post etch residues or post ash residues with the cleaning composition of claim 1 .

87. The method of claim 86 , further comprising rinsing the semiconductor substrate with a rinse solvent after the contacting step.

88. An article formed by the method of claim 86 , wherein the article is a semiconductor device.

89. The article of claim 88 , wherein the semiconductor device is an integrated circuit.

90. A cleaning composition, comprising: a) at least one fluoride containing compound; b) at least one azole compound selected from the group consisting of diazoles, triazoles and tetrazoles; c) at least one organic solvent in an amount of at least about 90 wt % of the composition; d) at least one acid selected from the group consisting of sulfuric acid and methanesulfonic acid; and f) water.