Patentable/Patents/US-10888828
US-10888828

Device for adjusting the concentration of gas in a liquid

PublishedJanuary 12, 2021
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

The device for adjusting the concentration of a gas in a liquid includes a cartridge in which the concentration of the gas in the liquid is adjusted, a pipe for supplying the liquid into the cartridge, a pipe for supplying gas into the cartridge, and a pipe for discharging the liquid from the cartridge. The gas supply pipe includes an expansion valve with of which the pressure setpoint that is controlled by a setpoint for the quantity amount of gas in the liquid and by an amount of a quantity of gas in the liquid measured by a gas concentration sensor located in the liquid discharge pipe.

Patent Claims
8 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A device for adjusting concentration of a gas in a liquid, said device comprising: a cartridge in which occurs the change in concentration of the gas in the liquid, a liquid supply pipe into the cartridge, a gas supply pipe into the cartridge, a liquid discharge pipe out of the cartridge, and a vacuum pipe extracting from the cartridge at least one gas extracted from the liquid, wherein the gas supply pipe comprises a pressure regulator having a setpoint for the pressure controlled by a setpoint for amount of gas in the liquid and by an amount of gas in the liquid measured by a gas concentration sensor located in the liquid discharge pipe, and wherein the vacuum pipe comprises a vacuum pump and a vacuum management system between the cartridge and the vacuum pump so as to direct, depending on whether gas is added or not into the liquid by the gas supply pipe, the path through the vacuum pipe followed by the vacuum, being comprised of, in the absence of addition of gas into the liquid, a portion of the vacuum pipe, and, when gas is added into the liquid, an auxiliary vacuum pipe, which is parallel to said portion of the vacuum pipe, said portion having a first downstream valve between the cartridge and said vacuum pump and no vacuum adjusting organ, said auxiliary vacuum pipe having a second downstream valve between the cartridge and said vacuum pump and a vacuum adjusting valve between said second downstream valve and said vacuum pump.

2

2. The device for adjusting according to claim 1 , wherein the gas supply pipe comprises, between the cartridge and the pressure regulator, a gas management system adapted to control, depending on the setpoint for the pressure and a setpoint for the path, the gas path followed by the gas to enter into the cartridge, the gas path being, when the setpoint for the pressure is higher than the setpoint for the path, a portion of the gas supply pipe, which has a first pressure loss, and, when the setpoint for the pressure is lower than the setpoint for the path, an auxiliary gas supply pipe, which is parallel to the portion of the gas supply pipe and which has a second pressure loss higher than the first pressure loss, the setpoint for the path depending on the difference between the first and second pressure losses.

3

3. The device for adjusting according to claim 2 , wherein the first and second pressure losses are fixed.

4

4. The device for adjusting according to claim 3 , wherein the setpoint for the path is equal to the difference between the first and second pressure losses.

5

5. The device for adjusting according to claim 1 , wherein the gas extraction by the vacuum is controlled by a setpoint for the vacuum, which, when the vacuum passes through the portion of the vacuum pipe, controls the vacuum pump and, when the vacuum passes through the auxiliary vacuum pipe, controls the adjusting valve.

6

6. The device for adjusting according to claim 5 , wherein, when the vacuum passes through the portion of the vacuum pipe, the setpoint for the vacuum is determined according to the setpoint for the amount of a gas in the liquid and the amount of this gas in the liquid measured by a concentration sensor of this gas, which is located in the liquid discharge pipe.

7

7. The device for adjusting according to claim 5 , wherein, when the vacuum passes through the vacuum pipe, the setpoint for the vacuum is determined depending on the setpoint for the amount of a gas in the liquid and the amount of this gas in the liquid measured by a concentration sensor of this gas, which is located in the liquid discharge pipe.

8

8. The device for adjusting according to claim 7 , wherein, when it cannot meet both the setpoint for the amount of a first gas in the liquid, which is introduced into the cartridge by the gas supply pipe and which is extracted from the cartridge by the vacuum pipe, and the setpoint for the amount of a second gas in the liquid, which is extracted from the cartridge by the vacuum pipe, the adjusting device is configured to meet, by priority, the setpoint for the amount of the first gas in the liquid.

Classification Codes (CPC)

Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.

Patent Metadata

Filing Date

May 27, 2016

Publication Date

January 12, 2021

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Cite as: Patentable. “Device for adjusting the concentration of gas in a liquid” (US-10888828). https://patentable.app/patents/US-10888828

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