Provided a method of producing a carrier which make it possible to prevent the reduction in the flatness of a semiconductor wafer even if the semiconductor wafer is subjected to repeated double-side polishing procedures. The method of producing a carrier including a metal portion and a ring-shaped resin portion includes: a preparation step of preparing the metal portion and the resin portion (Step S1); a placement step of placing the resin portion in the retainer opening in the metal portion (Step S2); and a resin portion polishing step of polishing both surface of the resin portion (Step S4). The method includes, prior to the resin portion polishing step (Step S4), a production stage swelling step of swelling the resin portion placed in the retainer opening in the metal portion by impregnating the resin portion with a first liquid (Step S3).
Legal claims defining the scope of protection, as filed with the USPTO.
1. A method of producing a carrier including a metal portion having a retainer opening for retaining a semiconductor wafer, and a ring-shaped resin portion that is placed along an inner wall defining the retainer opening in the metal portion and protects a peripheral portion of the semiconductor wafer, comprising: preparing the metal portion and the resin portion; placing the resin portion in the retainer opening in the metal portion; and polishing both surfaces of the resin portion, wherein the method comprises, prior to the resin portion polishing, swelling the resin portion placed in the retainer opening in the metal portion by impregnating the resin portion with a first liquid.
2. The method of producing a carrier, according to claim 1 , wherein the swelling is performed by immersing at least the resin portion in the first liquid.
3. The method of producing a carrier, according to claim 1 , wherein the swelling is performed for 24 hours or more.
4. The method of producing a carrier, according to claim 1 , wherein the swelling is performed until a rate of change in a thickness of the resin portion per 24 hours becomes 0.2% or less.
5. The method of producing a carrier, according to claim 1 , wherein the first liquid is one of water, a slurry, and an aqueous solution containing a surfactant.
6. The method of producing a carrier, according to claim 1 , wherein the resin portion is made of one of aramid, polyamide, polyacetal, polyvinyl chloride, polypropylene, polyvinylidene fluoride, and a fluorine-based resin.
7. The method of producing a carrier, according to claim 1 , wherein the resin portion contains glass fiber.
8. A method of polishing a wafer, comprising polishing both surfaces of a semiconductor wafer by retaining the semiconductor wafer in the retainer opening of the carrier produced by the method of producing a carrier, according to claim 1 , and rotating an upper plate and a lower plate of a double-side polishing apparatus with the carrier being sandwiched between the upper plate and the lower plate, wherein the method of polishing a wafer comprises, prior to the wafer polishing, swelling the resin portion in the carrier by impregnating the resin portion with a second liquid.
9. The method of polishing a wafer, according to claim 8 , wherein the swelling is performed by immersing at least the resin portion in the second liquid.
10. The method of polishing a wafer, according to claim 8 , wherein a time for which the resin portion is impregnated with the first liquid and a time for which the resin portion is impregnated with the second liquid are the same.
11. The method of polishing a wafer, according to claim 8 , wherein the second liquid is the same as the first liquid.
12. The method of polishing a wafer, according to claim 8 , wherein the second liquid is one of water, a slurry, and an aqueous solution containing a surfactant.
13. The method of polishing a wafer, according to claim 8 , wherein the semiconductor wafer is a silicon wafer.
14. A method of polishing a wafer, comprising polishing both surfaces of a semiconductor wafer by retaining the semiconductor wafer in the retainer opening of the carrier produced by the method of producing a carrier, according to claim 2 , and rotating an upper plate and a lower plate of a double-side polishing apparatus with the carrier being sandwiched between the upper plate and the lower plate, wherein the method of polishing a wafer comprises, prior to the wafer polishing, swelling the resin portion in the carrier by impregnating the resin portion with a second liquid.
15. A method of polishing a wafer, comprising polishing both surfaces of a semiconductor wafer by retaining the semiconductor wafer in the retainer opening of the carrier produced by the method of producing a carrier, according to claim 3 , and rotating an upper plate and a lower plate of a double-side polishing apparatus with the carrier being sandwiched between the upper plate and the lower plate, wherein the method of polishing a wafer comprises, prior to the wafer polishing, swelling the resin portion in the carrier by impregnating the resin portion with a second liquid.
16. A method of polishing a wafer, comprising polishing both surfaces of a semiconductor wafer by retaining the semiconductor wafer in the retainer opening of the carrier produced by the method of producing a carrier, according to claim 4 , and rotating an upper plate and a lower plate of a double-side polishing apparatus with the carrier being sandwiched between the upper plate and the lower plate, wherein the method of polishing a wafer comprises, prior to the wafer polishing, swelling the resin portion in the carrier by impregnating the resin portion with a second liquid.
17. A method of polishing a wafer, comprising polishing both surfaces of a semiconductor wafer by retaining the semiconductor wafer in the retainer opening of the carrier produced by the method of producing a carrier, according to claim 5 , and rotating an upper plate and a lower plate of a double-side polishing apparatus with the carrier being sandwiched between the upper plate and the lower plate, wherein the method of polishing a wafer comprises, prior to the wafer polishing, swelling the resin portion in the carrier by impregnating the resin portion with a second liquid.
18. A method of polishing a wafer, comprising polishing both surfaces of a semiconductor wafer by retaining the semiconductor wafer in the retainer opening of the carrier produced by the method of producing a carrier, according to claim 6 , and rotating an upper plate and a lower plate of a double-side polishing apparatus with the carrier being sandwiched between the upper plate and the lower plate, wherein the method of polishing a wafer comprises, prior to the wafer polishing, swelling the resin portion in the carrier by impregnating the resin portion with a second liquid.
19. A method of polishing a wafer, comprising polishing both surfaces of a semiconductor wafer by retaining the semiconductor wafer in the retainer opening of the carrier produced by the method of producing a carrier, according to claim 7 , and rotating an upper plate and a lower plate of a double-side polishing apparatus with the carrier being sandwiched between the upper plate and the lower plate, wherein the method of polishing a wafer comprises, prior to the wafer polishing, swelling the resin portion in the carrier by impregnating the resin portion with a second liquid.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
August 14, 2018
September 21, 2021
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