A nonvolatile memory device including: a first semiconductor layer comprising a plurality of first word lines extending in a first direction, a first upper substrate and a first memory cell array, a second semiconductor layer including a plurality of second word lines extending in the first direction, second and third upper substrates adjacent to each other in the first direction and a second memory cell array, wherein the second memory cell array includes a first vertical structure on the first upper substrate and a second vertical structure on the second upper substrate, wherein the first semiconductor layer and the second semiconductor layer share a plurality of bit lines extending in a second direction, and a third semiconductor layer under the second semiconductor layer in a third direction perpendicular to the first and second directions, wherein the third semiconductor layer includes a lower substrate that includes a plurality of row decoder circuits and a plurality of page buffer circuits, wherein the first vertical structure includes a first via area in which a first through-hole via is provided, wherein the first through-hole via passes through the first vertical structure and connects a first bit line and a first page buffer circuit, and the second vertical structure includes a first partial block, wherein the first partial block overlaps the first via area in the first direction.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A nonvolatile memory device, comprising: a first semiconductor layer comprising a plurality of first word lines extending in a first direction, a first upper substrate and a first memory cell array; a second semiconductor layer comprising a plurality of second word lines extending in the first direction, second and third upper substrates adjacent to each other in the first direction and a second memory cell array, wherein the second memory cell array comprises a first vertical structure on the first upper substrate and, a second vertical structure on the second upper substrate, wherein the first semiconductor layer and the second semiconductor layer share a plurality of bit lines extending in a second direction; and a third semiconductor layer under the second semiconductor layer in a third direction perpendicular to the first and second directions, wherein the third semiconductor layer comprises a lower substrate that comprises a plurality of row decoder circuits and a plurality of page buffer circuits, wherein the first vertical structure comprises a first via area in which a first through-hole via is provided, wherein the first through-hole via passes through the first vertical structure and connects a first bit line and a first page buffer circuit, and the second vertical structure comprises a first partial block, wherein the first partial block overlaps the first via area in the first direction.
2. The nonvolatile memory device of claim 1 , wherein the third semiconductor layer comprises first, second, third and fourth regions that are divided along the first and second directions at a point overlapping the second memory cell array in the third direction, wherein the first and second regions are adjacent to each other in the first direction, and the second and third regions are adjacent to each other in the second direction, wherein the first page buffer circuit is located in the first region and a second page buffer circuit is located in the third region.
3. The nonvolatile memory device of claim 2 , wherein the plurality of row decoder circuits comprise first and second row decoder circuits respectively located in the second and fourth regions, and the first partial block is electrically connected to the second row decoder circuit.
4. The nonvolatile memory device of claim 3 , further comprising a control circuit configured to control the second row decoder circuits to access the first partial block.
5. The nonvolatile memory device of claim 1 , wherein the second vertical structure further comprises a second via area in which a second through-hole via is provided, wherein the second through-hole via passes through the second vertical structure and connects a second bit line and a second page buffer circuit, wherein the first vertical structure further comprises a second partial block, wherein the second partial block overlaps the second via area in the first direction.
6. The nonvolatile memory device of claim 1 , wherein the first partial block comprises a plurality of gate conductive layers stacked on the second upper substrate.
7. The nonvolatile memory device of claim 6 , wherein the first partial block comprises a plurality of pillars that pass through the plurality of gate conductive layers and extend from a top surface of the second upper substrate in the third direction.
8. The nonvolatile memory of claim 6 , wherein the first partial block comprises a second through-hole via that passes through the plurality of gate conductive layers.
9. The nonvolatile memory device of claim 5 , wherein the first partial block is provided plural in number, and the second partial block is provided plural in number, wherein the number of the first partial blocks and the number of the second partial blocks are equal to each other.
10. A nonvolatile memory device, comprising: a first semiconductor layer comprising a first upper substrate, and a first memory cell array; a second semiconductor layer comprising a second upper substrate and a third upper substrate that are adjacent to each other in a first direction and a second memory cell array that comprises first and second vertical structures, the first and second vertical structures comprising a plurality of channel layers that vertically extend from the first and second upper substrates and first and second gate conductive layers that are respectively stacked on the second and third upper substrates alongside walls of the plurality of channel layers, wherein the first semiconductor layer and the second semiconductor layer share a plurality of bit lines extending in a second direction; and a third semiconductor layer located under the second semiconductor layer in a third direction, the third semiconductor layer comprising a lower substrate that comprises a plurality of row decoder circuits and a plurality of page buffer circuits, wherein, the first vertical structure further comprises a first through-hole via that passes through the first vertical structure and is connected to a first page buffer circuit, and the second vertical structure further comprises a first partial block, wherein the first partial block overlaps a first via area in the first direction and comprises an edge region electrically connected to a first row decoder circuit.
11. The nonvolatile memory device of claim 10 , wherein at least one of the plurality of channel layers is located in the first partial block.
12. The nonvolatile memory device of claim 10 , wherein the third semiconductor layer comprises first, second, third and fourth regions that are divided along the first and second directions at a point overlapping the second memory cell array in the third direction, wherein the first and second regions are adjacent to each other in the first direction, and the second and third regions are adjacent to each other in the second direction, wherein the first page buffer circuit is located in the first region and a second page buffer circuit is located in the third region.
13. The nonvolatile memory device of claim 12 , wherein the plurality of row decoder circuits comprise first and second row decoder circuits respectively located in the second and fourth regions, and the first partial block is electrically connected to the second tow decoder circuit.
14. The nonvolatile memory device of claim 13 , further comprising a control circuit configured to control the second row decoder circuits to access the first partial block.
15. The nonvolatile memory device of claim 10 , wherein the second vertical structure further comprises a second via area in which a second through-hole via is provided, wherein the second through-hole via passes through the second vertical structure and connects a second bit line and a second page buffer circuit, wherein the first vertical structure further comprises a second partial block, wherein the second partial block overlaps the second via area in the first direction.
16. A nonvolatile memory device, comprising: a first semiconductor layer including a first memory cell array; a second semiconductor layer including a first vertical structure and a second vertical structure, each of the first and second vertical structures including gate conductive layers stacked in a first direction wherein the first semiconductor layer and the second semiconductor layer shares a plurality of bit lines extending in a second direction substantially perpendicular to the first direction; and a third semiconductor layer disposed under the second semiconductor layer along the first direction, the third semiconductor layer including a row decoder disposed under the first vertical structure and a page buffer disposed under the second vertical structure, wherein the first vertical structure includes a plurality of first partial blocks and a plurality of first via areas, the second vertical structure includes a plurality of second partial blocks and a plurality of second via areas, and at least one of the first partial blocks overlaps at least one of the second via areas in a third direction substantially perpendicular to the first direction and the second direction.
17. The nonvolatile memory device of claim 16 , wherein at least one of the first via areas overlaps at least one of the second partial blocks in the third direction.
18. The nonvolatile memory device of claim 16 , wherein the at least one first partial block overlaps the row decoder in the first direction.
19. The nonvolatile memory device of claim 16 , wherein at least one of the second partial blocks overlaps the page buffer in the first direction.
20. The nonvolatile memory device of claim 16 , wherein a number of the first partial blocks and a number of the second partial blocks are equal to each other.
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October 19, 2020
December 28, 2021
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