Various implementations described herein are directed to a device having memory with a first array and a second array. The device may have power rails formed in frontside metal layers that supply core voltage to the memory. The power rails may include a first path routed through a first frontside metal layer to the first array of the memory, and the power rails may include a second path routed through the first frontside metal layer and a second frontside metal layer to the second array of the memory.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A device, comprising: memory having a first array and a second array, wherein the first array has first bitcells, and wherein the second array has second bitcells; and power rails formed in frontside metal layers that supply core voltage to the memory; wherein the power rails include a first path routed through a first frontside metal layer to the first bitcells in the first array of the memory, and wherein the power rails include a second path routed through the first frontside metal layer and a second frontside metal layer to the second bitcells in the second array of the memory.
2. The device of claim 1 , further comprising: an inter-layer transition via that couples the first frontside metal layer to the second frontside metal layer of the second path, wherein the second path is routed through the first frontside metal layer and the second frontside metal layer by way of the transition via.
3. The device of claim 1 , wherein: the second path has a first segment disposed in the second frontside metal layer and a second segment disposed in the first frontside metal layer.
4. A device, comprising: memory having a first array and a second array; and power rails formed in frontside metal layers that supply core voltage to the memory, wherein the power rails include a first path routed through a first frontside metal layer to the first array of the memory, wherein the power rails include a second path routed through the first frontside metal layer and a second frontside metal layer to the second array of the memory, wherein the second path has a first segment disposed in the second frontside metal layer and a second segment disposed in the first frontside metal layer, wherein the power rails include a third path routed through the second frontside metal layer to the second array of the memory, and wherein the third path has a third segment that is coupled in parallel with the second segment of the second path by way of inter-layer transition vias.
5. The device of claim 4 , wherein: the power rails include a fourth path routed through a backside metal layer to the first array of the memory, and the fourth path is coupled in parallel with the first path by way of inter-layer transition vias.
6. The device of claim 4 , wherein: the power rails include a fourth path routed through the second frontside metal layer to the first array of the memory, and the fourth path is coupled in parallel with the first path by way of inter-layer transition vias.
7. A device, comprising: memory having a first array and a second array; and power rails formed in frontside metal layers that supply core voltage to the memory, wherein the power rails include a first path routed through a first frontside metal layer to the first array of the memory, wherein the power rails include a second path routed through the first frontside metal layer and a second frontside metal layer to the second array of the memory, wherein the first array and the second array have bitcells, and wherein the core voltage is coupled to first ends of the power rails associated with the first path and the second path to thereby provide the core voltage to power supply connections of the bitcells in the first array and the second array of the memory.
8. The device of claim 7 , further comprising: footer transistors coupled to second ends of the power rails, and each of the footer transistors are alternately activated and deactivated with separate pulse signals so as to thereby alternately pre-charge and discharge the power rails based on the separate pulse signals.
9. A device, comprising: memory having a first array and a second array; and power rails formed in a frontside metal layer and a backside metal layer that supply core voltage to the memory; wherein the power rails include a first path routed through the frontside metal layer to the first array of the memory, and wherein the power rails include a second path routed through the frontside metal layer and the backside metal layer to the second array of the memory.
10. The device of claim 9 , further comprising: an inter-layer transition via that couples the frontside metal layer to the backside metal layer, wherein the second path is routed through the frontside metal layer and the backside metal layer by way of the transition via.
11. The device of claim 9 , wherein: the second path has a first segment disposed in the backside metal layer and a second segment disposed in the frontside metal layer.
12. A device, comprising: memory having a first array and a second array; and power rails formed in a frontside metal layer and a backside metal layer that supply core voltage to the memory, wherein the power rails include a first path routed through the frontside metal layer to the first array of the memory, wherein the power rails include a second path routed through the frontside metal layer and the backside metal layer to the second array of the memory, wherein the second path has a first segment disposed in the backside metal layer and a second segment disposed in the frontside metal layer, wherein the power rails include a third path routed through the backside metal layer to the second array of the memory, and wherein the third path has a third segment that is coupled in parallel with the second segment of the second path by way of inter-layer transition vias.
13. The device of claim 12 , wherein: the frontside metal layer refers to a first frontside metal layer, the power rails include a fourth path routed through a second frontside metal layer to the first array of the memory, and the fourth path is coupled in parallel with the first path by way of inter-layer transition vias.
14. The device of claim 12 , wherein: the power rails include a fourth path routed through the backside metal layer to the first array of the memory, and the fourth path is coupled in parallel with the first path by way of inter-layer transition vias.
15. A device, comprising: memory having a first array and a second array; and power rails formed in a frontside metal layer and a backside metal layer that supply core voltage to the memory, wherein the power rails include a first path routed through the frontside metal layer to the first array of the memory, and wherein the power rails include a second path routed through the frontside metal layer and the backside metal layer to the second array of the memory, wherein the first array and the second array have bitcells, and wherein the core voltage is coupled to first ends of the power rails associated with the first path and the second path to thereby provide the core voltage to power supply connections of the bitcells in the first array and the second array of the memory.
16. The device of claim 15 , further comprising: footer transistors coupled between second ends of the power rails and ground, and each of the footer transistors are alternately activated and deactivated with separate pulse signals so as to thereby alternately pre-charge and discharge the power rails based on the separate pulse signals.
17. A method, comprising: fabricating memory with a first array and a second array, wherein the first array has first bitcells, and wherein the second array has second bitcells; fabricating power rails formed in frontside metal layers that supply core voltage to the first array and the second array of the memory; providing the power rails with a first path routed through a first frontside metal layer to the first bitcells in the first array of the memory; and providing the power rails with a second path routed through the first frontside metal layer and a second frontside metal layer to the second bitcells in the second array of the memory.
18. The method of claim 17 , further comprising: fabricating an inter-layer transition via that couples the first frontside metal layer to the second frontside metal layer of the second path; and routing the second path through the first frontside metal layer and the second frontside metal layer by way of the transition via.
19. A method, comprising: fabricating memory having a first array and a second array; fabricating power rails formed in a frontside metal layer and a backside metal layer that supply core voltage to the memory; providing the power rails with a first path routed through the frontside metal layer to the first array of the memory; and providing the power rails with a second path routed through the frontside metal layer and the backside metal layer to the second array of the memory.
20. The method of claim 19 , further comprising: fabricating an inter-layer transition via that couples the frontside metal layer to the backside metal layer; and routing the second path through the frontside metal layer and the backside metal layer by way of the transition via.
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October 21, 2020
April 26, 2022
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