The semiconductor apparatus includes: a thermal source TS including a semiconductor device generating heat in an operating state; a thermal diffusion unit thermally connected to the thermal source TS, the thermal diffusion unit including space in a direction opposite to the thermal source; a plurality of air-cooling fin units disposed in the space of the thermal diffusion unit, one end of the plurality of fin unit is connected to the thermal diffusion unit; and a base unit connected to the thermal diffusion unit, wherein the plurality of air-cooling fin units is connected to the base unit through a plurality of thermal contact units CP1, CP2, CP3, . . . , CPn. Provide is an air-cooling type semiconductor apparatus, power module, and power supply, each having high heat dissipation performance and realizing light weight.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A semiconductor apparatus comprising: a thermal source comprising a semiconductor device, the semiconductor device generating heat in an operating state; a thermal diffusion unit that is thermally connected to the thermal source and forms a space at a position opposite to the thermal source by means of a first portion extending from a connecting portion with the thermal source to both sides along a first direction parallel to a connecting surface with the thermal source and second and third portions respectively extending from both ends of the first portion in a second direction opposite to the thermal source; a first thermal conduction layer attached to a space-side surface of the second portion, and a second thermal conduction layer attached to a space-side surface of the third portion; a first heat dissipation unit that is attached to the first thermal conduction layer and has a first base unit and a plurality of first fin units arranged so as to extend in the space from the first base unit; and a second heat dissipation unit that is attached to the second thermal conduction layer and has a second base unit and a plurality of second fin units arranged so as to extend in the space from the second base unit.
2. The semiconductor apparatus according to claim 1 , wherein air flows in a direction orthogonal to a surface formed by the first to third portions.
3. The semiconductor apparatus according to claim 2 , wherein the first and second base units comprise a graphite substrate having an anisotropic thermal conductivity.
4. The semiconductor apparatus according to claim 1 , further comprising a thermal contact space unit surrounded with the thermal diffusion unit, the thermal contact space unit spatially containing the plurality of first fin units and the plurality of second fin units.
5. The semiconductor apparatus according to claim 1 , wherein the thermal diffusion unit comprises Cu or a vapor chamber.
6. The semiconductor apparatus according to claim 1 , wherein the semiconductor device comprises any one selected from a group consisting an Si based or SiC based IGBT, a diode, a MOSFET, and a GaN based FET.
7. The semiconductor apparatus according to claim 1 , wherein tips of the first and second plurality of fin units extend into the space to a position directly under a position where the semiconductor device is disposed.
8. The semiconductor apparatus according to claim 1 , wherein a length of the first and second plurality of fin units is longer than a distance between the first fin unit and the second fin unit facing each other in the space.
9. The semiconductor apparatus according to claim 1 , wherein the first and second thermal conduction layers are soldering layers.
10. The semiconductor apparatus according to claim 1 , wherein the first and second base units and the first and second plurality of fin units are composed of a same material.
11. The semiconductor apparatus according to claim 1 , wherein the first and second base units and the first and second plurality of fin units are composed of materials different from each other.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
May 6, 2020
July 12, 2022
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