The present disclosure provides a substrate processing apparatus including at least one input/output chamber. The load lock device includes a base, a guide rail, a platform and an optical measuring module. The guide rail is connected to the base. The platform, carrying a cassette for holding a batch of spaced substrates, is movably disposed on the guide rail. The optical measuring module is configured to acquire an actual moving distance traveled by the platform along the guide rail based on at least one optical signal reflected from the platform.
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2. The substrate processing apparatus of claim 1, wherein the load lock device further comprises a motor electrically coupled to the processor and configured to move the platform upward and downward along the guide rail, wherein the controller is configured to generate a preset moving distance for moving the platform, wherein the preset moving distance is provided to the processor and eventually the motor, and the processor is configured to compare a difference between the preset moving distance and the actual moving distance and issue an alarm if the difference is greater than a threshold.
A substrate processing apparatus includes a load lock device designed to transfer substrates between different environments, such as between a cleanroom and a vacuum chamber. The load lock device contains a platform that moves vertically along a guide rail to position substrates for transfer. A motor, controlled by a processor, drives the platform's movement. The processor receives a preset moving distance from a controller, which specifies the intended vertical displacement of the platform. The processor monitors the actual movement of the platform and compares it to the preset distance. If the difference between the preset and actual distances exceeds a predefined threshold, the processor triggers an alarm to indicate a potential malfunction or misalignment. This ensures precise positioning of the platform, preventing errors during substrate handling. The system enhances reliability in semiconductor or flat-panel display manufacturing by detecting and alerting to deviations in platform movement, thereby maintaining process accuracy and reducing defects.
3. The substrate processing apparatus of claim 2, wherein the optical measuring module further comprises a display for displaying the actual moving distance and a comparison result.
A substrate processing apparatus includes an optical measuring module that determines the actual moving distance of a substrate stage during processing. The apparatus is designed for precise substrate positioning, addressing challenges in maintaining accuracy during high-speed or high-precision operations. The optical measuring module uses a light source and a detector to measure displacement, compensating for errors caused by mechanical or environmental factors. The module further includes a display that shows the measured moving distance and compares it against a reference or expected value, providing real-time feedback to operators or control systems. This allows for immediate adjustments to ensure processing accuracy. The system may also include a calibration mechanism to verify and correct measurement deviations, enhancing long-term reliability. The display functionality supports quality control by visually indicating deviations, enabling corrective actions before defects occur. The apparatus is particularly useful in semiconductor manufacturing, where precise substrate alignment is critical for yield and performance.
5. The substrate processing apparatus of claim 4, wherein the optical measuring module further comprises a light reflector disposed on the platform and in an optical propagation path of light to direct light generally to the light receiver.
The invention relates to a substrate processing apparatus designed to enhance optical measurement accuracy during substrate processing. The apparatus addresses the challenge of precisely measuring substrate properties, such as thickness or surface characteristics, in real-time while minimizing interference from processing conditions. The optical measuring module, integrated into the apparatus, includes a light source, a light receiver, and a platform supporting the substrate. A key improvement involves a light reflector positioned on the platform within the optical path of the light. This reflector redirects light from the substrate toward the light receiver, ensuring accurate detection of reflected or transmitted light signals. The reflector optimizes the optical path, reducing signal loss and improving measurement reliability. The apparatus may also include a substrate holder with adjustable positioning to align the substrate relative to the optical measuring module, further enhancing measurement precision. The system is particularly useful in semiconductor manufacturing, where precise substrate monitoring is critical for yield and quality control. The reflector's placement ensures consistent light redirection, compensating for variations in substrate positioning or processing conditions. This design improves the overall robustness and accuracy of optical measurements in dynamic processing environments.
6. The substrate processing apparatus of claim 4, wherein the light emitter and the light receiver are disposed on the base.
A substrate processing apparatus is designed for inspecting or analyzing substrates, such as semiconductor wafers or display panels, during or after manufacturing. The apparatus addresses the challenge of accurately detecting defects or measuring properties like thickness, uniformity, or surface quality in real-time without disrupting the production process. Traditional inspection methods often require separate systems, leading to inefficiencies and potential contamination risks. The apparatus includes a base that supports the substrate during processing. A light emitter and a light receiver are mounted on the base to perform optical measurements. The light emitter directs light onto the substrate, while the receiver captures reflected or transmitted light to analyze the substrate's characteristics. This integrated design ensures precise alignment and minimizes external interference, improving measurement accuracy. The base may also include additional components, such as a stage for positioning the substrate or sensors for environmental monitoring, to enhance functionality. By incorporating the light emitter and receiver directly on the base, the apparatus provides a compact, efficient solution for in-line substrate inspection, reducing downtime and improving yield in manufacturing processes.
9. The substrate processing apparatus of claim 8, further comprising a plurality of gate valves electrically coupled to the controller, wherein the gate valves, during a close operation, are employed to hermetically isolate the input/output chamber from the processing chamber, and the gate valves, during an open operation, allow the handler to load and unload the substrates.
This invention relates to substrate processing apparatuses, specifically those used in semiconductor or similar manufacturing environments where precise control of the processing environment is critical. The apparatus includes a processing chamber for treating substrates, an input/output chamber for loading and unloading substrates, and a handler for transferring substrates between these chambers. The apparatus also features a controller that manages the operations of the system, including the movement of the handler and the control of environmental conditions within the chambers. A key aspect of the invention is the inclusion of multiple gate valves that are electrically coupled to the controller. These gate valves are used to hermetically seal the input/output chamber from the processing chamber during a close operation, ensuring that the processing environment remains uncontaminated. When the gate valves are in an open operation, they allow the handler to load and unload substrates between the chambers. The controller coordinates these operations to maintain the integrity of the processing environment while enabling efficient substrate transfer. This design improves contamination control and operational efficiency in substrate processing systems.
11. The substrate processing apparatus of claim 10, wherein the light emitter and the light receiver are disposed on the base and the platform, respectively.
This invention relates to a substrate processing apparatus designed to improve precision in substrate handling, particularly for tasks like alignment or inspection. The apparatus includes a base, a platform movable relative to the base, and a positioning mechanism to adjust the platform's position. A light emitter and a light receiver are used to detect the platform's position. In this specific embodiment, the light emitter is mounted on the base, while the light receiver is mounted on the platform. This configuration allows the apparatus to measure positional deviations between the base and platform by detecting light emitted from the base and received by the platform. The system may include additional components, such as a controller to process the detected signals and adjust the platform's position accordingly. The apparatus is particularly useful in semiconductor manufacturing, where precise substrate alignment is critical for processes like lithography or inspection. The invention addresses challenges in maintaining accuracy during substrate movement, ensuring consistent performance in high-precision applications.
12. The substrate processing apparatus of claim 10, wherein the actual moving distance traveled by the platform along the guide rail is determined based on an amount of light impinging on the light receiver.
A substrate processing apparatus includes a platform that moves along a guide rail to position a substrate for processing. The apparatus determines the actual moving distance traveled by the platform by measuring the amount of light impinging on a light receiver. The light receiver detects light emitted from a light source, and the distance is calculated based on the detected light intensity or duration. This measurement method ensures precise positioning of the platform, which is critical for accurate substrate processing. The apparatus may include a light source mounted on the platform or the guide rail, and the light receiver is positioned to detect the emitted light as the platform moves. The system may also include a controller that processes the light receiver data to calculate the distance traveled. This approach improves positioning accuracy compared to traditional mechanical or encoder-based systems, reducing errors in substrate alignment and processing. The apparatus is particularly useful in semiconductor manufacturing, where precise substrate positioning is essential for yield and performance. The light-based measurement system provides a non-contact, high-resolution method for tracking platform movement, enhancing reliability and reducing maintenance requirements.
13. The substrate processing apparatus of claim 10, wherein the actual moving distance traveled by the platform along the guide rail is determined based on a travel time of the light pulse from the light emitter to the light receiver.
A substrate processing apparatus includes a platform that moves along a guide rail to position substrates for processing. The apparatus uses a light-based measurement system to determine the actual moving distance traveled by the platform. This system includes a light emitter and a light receiver positioned along the guide rail. The light emitter generates a light pulse that travels to the light receiver, and the travel time of the light pulse is measured to calculate the distance traveled by the platform. This measurement method provides precise positioning control, ensuring accurate substrate alignment during processing. The apparatus may also include a motorized drive system to move the platform along the guide rail, with the light-based measurement system providing feedback to adjust the platform's position. The system may further include a controller that processes the travel time data to determine the platform's position and adjusts the drive system accordingly. This approach improves processing accuracy by reducing positional errors, which is critical in applications requiring high-precision substrate alignment, such as semiconductor manufacturing or flat-panel display production. The light-based measurement system eliminates the need for mechanical sensors, reducing wear and maintenance requirements while maintaining high accuracy.
14. The substrate processing apparatus of claim 10, wherein the optical measuring module further includes a processor electrically coupled to the light emitter and the light receiver, the load lock device further comprises a motor electrically coupled to the processor and configured to move the platform upward and downward along the guide rail, the controller is configured to generate a preset moving distance for moving the platform, wherein the preset moving distance is provided to the processor and eventually the motor, and the processor is configured to compare a difference between the preset moving distance and the actual moving distance and issue an alarm if the difference is greater than a threshold.
This invention relates to a substrate processing apparatus with an optical measuring module for monitoring platform movement in a load lock device. The apparatus addresses the problem of ensuring precise vertical movement of a platform along a guide rail during substrate processing, which is critical for maintaining process accuracy and preventing damage to substrates. The optical measuring module includes a light emitter and a light receiver that detect the platform's position. A processor is electrically coupled to these components and also to a motor that drives the platform's movement. The controller generates a preset moving distance for the platform, which is transmitted to the processor and then to the motor. The processor compares the preset distance with the actual distance traveled by the platform, calculated based on optical measurements. If the difference exceeds a predefined threshold, the processor issues an alarm to alert operators of a potential misalignment or malfunction. This system enhances process reliability by detecting deviations in platform movement, ensuring substrates are positioned accurately during processing. The optical measurement and real-time comparison with preset values provide a feedback mechanism to maintain precision in substrate handling.
15. The substrate processing apparatus of claim 14, wherein the optical measuring module further comprises a display for displaying the actual moving distance and a comparison result provided by the processor.
This invention relates to a substrate processing apparatus equipped with an optical measuring module for monitoring and controlling substrate movement. The apparatus addresses the challenge of accurately tracking and verifying the movement of substrates during processing to ensure precision in manufacturing operations. The optical measuring module includes a light source and a detector to measure the actual moving distance of the substrate. A processor analyzes this data to compare the measured distance against a target or expected value, generating a comparison result. The module further includes a display that shows both the actual moving distance and the comparison result, allowing operators to monitor performance in real time. This feedback mechanism helps maintain processing accuracy and detect deviations early. The system may also include a controller that adjusts substrate movement based on the comparison result, ensuring consistent and precise processing. The invention improves manufacturing reliability by integrating real-time measurement and feedback into the substrate handling process.
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March 3, 2021
December 6, 2022
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