According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate has a first major surface and a second major surface on opposite side from the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided at a position between the base plate and the first major surface of the ceramic dielectric substrate. The position is opposed to the gas feed channel. The first porous part includes a plurality of sparse portions each including a plurality of pores. The plurality of sparse portions are spaced from each other. Each of the plurality of sparse portions extends in a direction inclined by a prescribed angle with respect to a first direction from the base plate to the ceramic dielectric substrate.
Legal claims defining the scope of protection, as filed with the USPTO.
2. The electrostatic chuck according to claim 1, wherein the plurality of pores are configured so that a gas fed from the gas feed channel can flow therethrough.
3. The electrostatic chuck according to claim 1, wherein the angle between the first direction and the extending direction of the sparse portion is 5° or more and 30° or less.
7. The electrostatic chuck according to claim 6, wherein average value of diameter of the plurality of pores provided in the second porous part is larger than average value of diameter of the plurality of pores provided in the first porous part.
8. The electrostatic chuck according to claim 6, wherein average value of diameter of the plurality of pores provided in the second porous part is smaller than average value of diameter of the plurality of pores provided in the first porous part.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
September 19, 2019
April 11, 2023
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