Legal claims defining the scope of protection, as filed with the USPTO.
2. The method according to claim 1, wherein the second voltage comprises a negative voltage.
3. The method according to claim 2, wherein the etched region comprises a shallow hole etch (SHE) cut.
6. The method according to claim 5, wherein the second voltage comprises a negative voltage.
7. The method according to claim 6, wherein the etched region comprises a shallow hole etch (SHE) cut.
9. The memory system according to claim 8, wherein the second voltage comprises a negative voltage.
10. The memory system according to claim 9, wherein the etched region comprises a shallow hole etch (SHE) cut.
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October 3, 2023
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