Wet cleaning of electrostatic chuck

2. The cleaning fixture of claim 1, wherein materials of the shafts and the mounting plate are transparent such that the substrate supporting member is visible when coupled to the mounting plate.

3. The cleaning fixture of one of claim 1, wherein each of one or more features of the substrate supporting member is disposed within the recess when the substrate supporting member is coupled to the mounting plate.

4. The cleaning fixture of claim 1, wherein the mounting plate has a plurality of thru-holes arranged on a bolt circle and is configured to align with a plurality of thread holes disposed in the lower surface of the substrate supporting member.

5. The cleaning fixture of claim 4, further comprising screws disposed through the plurality of thru-holes and the plurality of thread holes configured to secure the substrate supporting member to the mounting plate with the lower surface exposed to the sealed plenum.

7. The method of claim 6, wherein the cleaning the electrostatic chuck with the chemical solution comprises at least one of wiping the substrate supporting surface with the chemical solution and immersing the substrate supporting surface in a chemical bath of the chemical solution.

8. The method of claim 7, wherein a length of shafts supporting the mounting plate allows for at least one of a machine tool, a hand, and the chemical bath to access the substrate supporting surface of the electrostatic chuck.

9. The method of claim 7, wherein materials of the shafts and the mounting plate are inert to the chemical solution.

10. The method of claim 7, wherein materials of the shafts and the mounting plate are transparent.

11. The method of claim 6, further comprising performing deionized (DI) water rinsing, ultrasonic cleaning, or high temperature baking after the cleaning the electrostatic chuck.

12. The method of claim 6, wherein the coupling the electrostatic chuck to the mounting plate includes disposing screws through a plurality of thru-holes of the cleaning fixture and a plurality of thread holes in the electrostatic chuck.

13. The method of claim 6, wherein the plenum pressure is about 10 psi to about 20 psi.